Hostname: page-component-745bb68f8f-d8cs5 Total loading time: 0 Render date: 2025-02-05T21:26:47.703Z Has data issue: false hasContentIssue false
  • English
  • Français

Magnetization Reversal by Rotation in Magnetic Thin Films Deposited on Step Bunched Si(111) Substrates

Published online by Cambridge University Press:  10 February 2011

M. Sussiau ,
A. Encinas ,
F. Nguyen Van Dau ,
A. Vaurès ,
A. Schuhl  and
P. Galtier
M. Sussiau
Affiliation:
Unité Mixte de Recherches Thomson - CNRS, Domaine de Corbeville, F-91404 OrsayFrance. vandau@lcr.thomson.fr
A. Encinas
Affiliation:
Unité Mixte de Recherches Thomson - CNRS, Domaine de Corbeville, F-91404 OrsayFrance. vandau@lcr.thomson.fr
F. Nguyen Van Dau
Affiliation:
Unité Mixte de Recherches Thomson - CNRS, Domaine de Corbeville, F-91404 OrsayFrance. vandau@lcr.thomson.fr
A. Vaurès
Affiliation:
Unité Mixte de Recherches Thomson - CNRS, Domaine de Corbeville, F-91404 OrsayFrance. vandau@lcr.thomson.fr
A. Schuhl
Affiliation:
Unité Mixte de Recherches Thomson - CNRS, Domaine de Corbeville, F-91404 OrsayFrance. vandau@lcr.thomson.fr
P. Galtier
Affiliation:
Unité Mixte de Recherches Thomson - CNRS, Domaine de Corbeville, F-91404 OrsayFrance. vandau@lcr.thomson.fr
Get access

Abstract

Magnetic and magnetoresistive properties of magnetic thin films deposited on periodically structured substrates have been studied. By using a thermodynamical heat treatment, we activate the step bunching phenomenon on vicinal Si(111) substrates misoriented towards [112] which results in a laterally modulated surface with a period around 0.1 μm. Epitaxial magnetic thin films deposited on these substrates exhibit an in-plane uniaxial anisotropy and a specific magnetoresistive behavior which characterizes the magnetization reversal process. In this contribution, we demonstrate that these properties can also be observed in non-epitaxial structures grown either by molecular beam epitaxy or by sputtering. In particular, magnetotransport measurements show that by varying parameters such as the nature of the magnetic metal, the layer thickness or the strength of the induced anisotropy, we can modulate the interplay between the anisotropy and the exchange stiffness, and, consequently, observe gradual magnetization reversal behaviors between a Stoner-Wohlfarth uniform mode and a non-uniform mode.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 475: Symposium M – Magnetic Ultrathin Films, Multilayers, and Surfaces – 1997 , 1997 , 195
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. de la Figuera, J., Huerta-Guernica, M.A., Prieto, J.E., Ocal, C. and Miranda, R., Appl. Phys. Lett., 66, 1006 (1995).Google Scholar
2. Wulfhekel, W., Knappmann, S. and Oepen, H.P., J. Appl. Phys., 79, 988 (1996).Google Scholar
3. Oepts, W., Gijs, M.A.M., Reinders, A., Jungblut, R.M., van Ganseinkel, R.M.J. and de Jonge, W.J.M., Phys. Rev. B, 53, 14024 (1996).Google Scholar
4. Sussiau, M., Nguyen Van Dau, F., Galtier, P. and Schuhl, A., Appl. Phys. Lett., 69, 857 (1996).Google Scholar
5. Sussiau, M., Nguyen Van Dau, F., Galtier, P., Encinas, A. and Schuhi, A., J. Mag. Mag. Mat., 165, 1 (1997).Google Scholar
6. Nguyen Van Dau, F., Sussiau, M., Schuhl, A. and Galtier, P., J. Appl. Phys., 81 (8) (1997), to appear.Google Scholar
7. Emmerson, C.M. and Shen, T.-H., J. Mag. Mag. Mat., 156, 15 (1996).Google Scholar
8. Stoner, E.C. and Wohlfarth, E.P., Trans. Roy. Soc. (London), A 240, 599 (1948).Google Scholar
9. This explanation is only valid at 0 K. Hf is the reverse field for which both the first and second derivative of the energy becomes zero.Google Scholar
10. Although the averaging is denoted by brackets in both cases, the kind of averaging is obviously not the same for the two experiments.Google Scholar
11. Wernsdorfer, W., Doudin, B., Mailly, D., Hasselbach, K., Benoit, A., Meier, J., Ansermet, J-Ph. and Barbara, B., Phys. Rev. Lett., 77, 1873 (1996).Google Scholar