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Melting Velocity Measurements in Silicon
Published online by Cambridge University Press: 26 February 2011
Abstract
Melting velocities in silicon were measured on a picosecond time scale by employing pump-probe and self-reflectivity measurements. The pump laser was a 40 picosecond XeCl excimer (308 am) and the probe a dye laser at 600 am. Samples were phosphorous doped silicon wafers. Average melt-in velocities as high as 800 m/s were observed. Best fit to the data was achieved with an asymmetric transient state theory model.
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- Research Article
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- Copyright © Materials Research Society 1992
References
1. See, for example, MRS Proceedings volumes 1,12,35,51,74,100,157.Google Scholar
2
Burghardt, B., Nikolaus, B., and Pummer, H., “The PSL 4000 - a picosecond excimer laser,” in Scientific and Engineering Applications of Commercial Devices. SPIE vol. 610.Google Scholar
3.
MacDonald, C.A. and Homan, B.E., Picosecond Time Resolved Amorphization Velocity Measurements in Silicon, this volume.Google Scholar
5.
Palik, E.D., Handbook of Optical Constants of Solids
Academic Press Handbook Series.Google Scholar