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MEMS Materials and Fabrication Technology on Large Areas: The Example of an X-ray Imager

Published online by Cambridge University Press:  17 March 2011

J.H. Daniel ,
B. Krusor ,
R. Lau ,
J.P. Lu ,
Y. Wang ,
M. Mulato ,
R.B. Apte ,
R.A. Street ,
A. Goredema  and
D.C. Boils-Boissier
...Show all authors
J.H. Daniel
Affiliation:
Xerox Palo Alto Research Center, 3333 Coyote Hill Rd, Palo Alto, CA 94304 Xerox Palo Alto Research Center, 3333 Coyote Hill Rd, Palo Alto, CA 94304, daniel@parc.xerox.com
B. Krusor
Affiliation:
Xerox Palo Alto Research Center, 3333 Coyote Hill Rd, Palo Alto, CA 94304
R. Lau
Affiliation:
Xerox Palo Alto Research Center, 3333 Coyote Hill Rd, Palo Alto, CA 94304
J.P. Lu
Affiliation:
Xerox Palo Alto Research Center, 3333 Coyote Hill Rd, Palo Alto, CA 94304
Y. Wang
Affiliation:
Xerox Palo Alto Research Center, 3333 Coyote Hill Rd, Palo Alto, CA 94304
M. Mulato
Affiliation:
Xerox Palo Alto Research Center, 3333 Coyote Hill Rd, Palo Alto, CA 94304
R.B. Apte
Affiliation:
Xerox Palo Alto Research Center, 3333 Coyote Hill Rd, Palo Alto, CA 94304
R.A. Street
Affiliation:
Xerox Palo Alto Research Center, 3333 Coyote Hill Rd, Palo Alto, CA 94304
A. Goredema
Affiliation:
Xerox Research Center Canada, 2660 Speakman Dr, Mississauga, Ontario, L5K 2L1
D.C. Boils-Boissier
Affiliation:
Xerox Research Center Canada, 2660 Speakman Dr, Mississauga, Ontario, L5K 2L1
S.E. Silver
Affiliation:
Xerox Research Center Canada, 2660 Speakman Dr, Mississauga, Ontario, L5K 2L1
P.M. Kazmaier
Affiliation:
Xerox Research Center Canada, 2660 Speakman Dr, Mississauga, Ontario, L5K 2L1
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Abstract

Micromachining has potential applications for large area image sensors and displays, but conventional MEMS technology, based on crystalline silicon wafers cannot be used. Instead, large area devices use deposited films on glass substrates. This presents many challenges for MEMS, both as regards materials for micro-machined structures and the integration with large area electronic devices. We are exploring the novel thick photoresist SU-8, as well as plating techniques for the fabrication of large area MEMS. As an example of its application, we have applied this MEMS technology to improve the performance of an amorphous silicon based image sensor array. SU-8 is explored as the structural material for the X-ray conversion screen and as a thick interlayer dielectric for the thin film readout electronics of the imager.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 657: Symposia EE – Materials Science of Microelectromechanical Systems (MEMS) Devices III , 2000 , EE9.3
Copyright
Copyright © Materials Research Society 2001

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References

REFERENCES

1. Rahn, J.T., Lemmi, F., Weisfield, R.L., Lujan, R., Mei, P., Lu, J.P., Ho, J., Ready, S.E., Apte, R.B., Nylen, P., Boyce, J., and Street, R.A., Proc. SPIE Conf. On Physics of Medical Imaging, 3659, San Diego, CA, Feb 1999, p. 510 Google Scholar
2. dpiX, LLC, 406 Hillview Ave., Palo Alto, CA 94304Google Scholar
3. Apte, R.B., US Pat 5981959Google Scholar
4. SU-8 is commercially available from MicroChem Corp, 1254 Chestnut Street, Newton, MA 02164Google Scholar
5. Lorenz, H., Despont, M., Fahrni, N., Brugger, J., Vettiger, P., Renaud, P., Sensors and Actuators A64, pp. 33–39, 1998 Google Scholar
6. Mulato, M., Lemmi, F., Lau, R., Lu, J.P., Ho, J., Ready, S.E., Rahn, J.T., and Street, R.A., Proc. SPIE, Physics of Medical Imaging, 3977, 26, (2000)Google Scholar
7. Daniel, J.H., Krusor, B., Apte, R.B., Mulato, M., Schuylenbergh, K. Van, Lau, R., Do, T., Street, R.A., Goredema, A., Boils-Boissier, D.C., Kazmaier, P.M., Proc. American Vacuum Society, 47th International Symposium, October 2-6, Boston, MA Google Scholar