Crossref Citations
This article has been cited by the following publications. This list is generated based on data provided by
Crossref.
Kitano, T.
1991.
Identification of vacancy clusters in FZ-Si crystals.
Physica Status Solidi (a),
Vol. 127,
Issue. 2,
p.
341.
Sinno, T
Dornberger, E
von Ammon, W
Brown, R.A
and
Dupret, F
2000.
Defect engineering of Czochralski single-crystal silicon.
Materials Science and Engineering: R: Reports,
Vol. 28,
Issue. 5-6,
p.
149.
Brown, Robert A.
Wang, Zhihong
and
Mori, Tatsuo
2001.
Engineering analysis of microdefect formation during silicon crystal growth.
Journal of Crystal Growth,
Vol. 225,
Issue. 2-4,
p.
97.
Huff, Howard R.
2002.
An Electronics Division Retrospective (1952-2002) and Future Opportunities in the Twenty-First Century.
Journal of The Electrochemical Society,
Vol. 149,
Issue. 5,
p.
S35.
Frewen, Thomas A.
Sinno, Talid
Dornberger, Erich
Hoelzl, Robert
von Ammon, Wilfried
and
Bracht, Hartmut
2003.
Global Parameterization of Multiple Point-Defect Dynamics Models in Silicon.
Journal of The Electrochemical Society,
Vol. 150,
Issue. 11,
p.
G673.
Porrini, M.
2005.
Impact of antimony doping on microdefect formation in Czochralski grown silicon crystals.
Crystal Research and Technology,
Vol. 40,
Issue. 10-11,
p.
1054.
Vanhellemont, Jan
Kamiyama, Eiji
and
Sueoka, Koji
2013.
Silicon Single Crystal Growth from a Melt: On the Impact of Dopants on thev/GCriterion.
ECS Journal of Solid State Science and Technology,
Vol. 2,
Issue. 4,
p.
P166.
Sueoka, Koji
Kamiyama, Eiji
and
Vanhellemont, Jan
2013.
Density functional theory study on the impact of heavy doping on Si intrinsic point defect properties and implications for single crystal growth from a melt.
Journal of Applied Physics,
Vol. 114,
Issue. 15,
Sueoka, Koji
Kamiyama, Eiji
Vanhellemont, Jan
and
Nakamura, Kozo
2014.
Stress and doping impact on intrinsic point defect behavior in growing single crystal silicon.
physica status solidi (b),
Vol. 251,
Issue. 11,
p.
2159.
Vanhellemont, Jan
Nakamura, Kozo
Kamiyama, Eiji
and
Sueoka, Koji
2015.
Defects and Impurities in Silicon Materials.
Vol. 916,
Issue. ,
p.
181.
Sueoka, Koji
Kamiyama, Eiji
Śpiewak, Piotr
and
Vanhellemont, Jan
2016.
Review—Properties of Intrinsic Point Defects in Si and Ge Assessed by Density Functional Theory.
ECS Journal of Solid State Science and Technology,
Vol. 5,
Issue. 4,
p.
P3176.
von Ammon, Wilfried
Sattler, Andreas
and
Kissinger, Gudrun
2017.
Springer Handbook of Electronic and Photonic Materials.
p.
1.
Yamaoka, S.
Kobayashi, K.
Sueoka, K.
and
Vanhellemont, J.
2017.
Density functional theory study of dopant effect on formation energy of intrinsic point defects in germanium crystals.
Journal of Crystal Growth,
Vol. 474,
Issue. ,
p.
104.
Kobayashi, K.
Yamaoka, S.
Sueoka, K.
and
Vanhellemont, J.
2017.
Thermal equilibrium concentration of intrinsic point defects in heavily doped silicon crystals - Theoretical study of formation energy and formation entropy in area of influence of dopant atoms-.
Journal of Crystal Growth,
Vol. 474,
Issue. ,
p.
110.
Kobayashi, Koji
Yamaoka, Shunta
and
Sueoka, Koji
2017.
Theoretical Study of Impact of Internal and External Stresses on Thermal Equilibrium Concentrations of Intrinsic Point Defects in Doped Si Crystals.
ECS Journal of Solid State Science and Technology,
Vol. 6,
Issue. 1,
p.
P78.
Porrini, M.
Voronkov, V. V.
and
Giannattasio, A.
2019.
Oxygen Precipitation in Highly Doped Silicon Substrates.
ECS Journal of Solid State Science and Technology,
Vol. 8,
Issue. 1,
p.
P12.
Sueoka, Koji
Mukaiyama, Yuji
Maeda, Susumu
Iizuka, Masaya
and
Mamedov, Vasif M.
2019.
Computer Simulation of Concentration Distribution of Intrinsic Point Defect Valid for All Pulling Conditions in Large-Diameter Czochralski Si Crystal Growth.
ECS Journal of Solid State Science and Technology,
Vol. 8,
Issue. 4,
p.
P228.
Potsidi, M. S.
Angeletos, T.
and
Londos, C. A.
2022.
The origin of infrared bands in nitrogen-doped Si.
Journal of Materials Science,
Vol. 57,
Issue. 9,
p.
5507.
Saring, Philipp
Abrosimov, Nikolay V.
and
Seibt, Michael
2022.
Nucleation of Nickel Disilicide Precipitates in Float‐Zone Silicon: The Role of Vacancies.
physica status solidi (a),
Vol. 219,
Issue. 17,
Sueoka, Koji
Narushima, Yasuhito
Torigoe, Kazuhisa
Nonaka, Naoya
Koga, Koutaro
Ono, Toshiaki
Horie, Hiroshi
and
Hourai, Masataka
2024.
Defect behavior during growth of heavily phosphorus doped Czochralski silicon crystals (II): Theoretical study.
Journal of Applied Physics,
Vol. 136,
Issue. 5,