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Microstructure and Gmr in (111) Sputter-Deposited Co/Cu Multilayers

Published online by Cambridge University Press:  15 February 2011

R.J. Pollard ,
M.J. Wilson  and
P.J. Grundy
R.J. Pollard
Affiliation:
Now at Department of Pure and Applied Physics, the Queen's University of Belfast, Belfast BT7 INN, UK
M.J. Wilson
Affiliation:
Joule Laboratory, Department of Physics, University of Salford, Salford M5 4WT, UK
P.J. Grundy
Affiliation:
Joule Laboratory, Department of Physics, University of Salford, Salford M5 4WT, UK
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Abstract

This paper presents the results of giant magnetoresistance (GMR), magnetic and microstructural investigations of sputter-deposited Co/Cu multilayers. The multilayers were designed to be at the second maximum of the oscillatory exchange coupling and were deposited onto a range of ion beam irradiated (111) Si substrates giving a transition from a random orientation to a highly oriented (111) texture. The randomly oriented multilayers exhibited mixed coupling and ∼20% GMR, which had components arising from irreversible and reversible magnetization changes, whereas the highly oriented (111) multilayers were almost completely ferromagnetically coupled and showed very little GMR.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 384: Symposium L – Magnetic Ultrathin films, Multilayers and Surfaces , 1995 , 365
Copyright
Copyright © Materials Research Society 1995

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References

REFERENCES

1. Parkin, S. S. P., Bhadra, R. and Roche, K. P., Phys. Rev. Lett. 66, 2152 (1991).Google Scholar
2. Tomlinson, M. E., Pollard, R. J., Lord, D. G. and Grundy, P. J., J. Magn. Magn. Mater. 111, 79 (1992).Google Scholar
3. Mattheis, R., Andra, W., Fritzsch, L., Hubert, A., Ruhrig, M. and Thrum, F., J. Magn. Magn. Mater. 121, 424 (1993).Google Scholar
4. Egelhoff, W. F. and Kief, M. T., IEEE Trans. Magn. 28 (1992) 2742 and Phys. Rev. B 45, 7795 (1992).Google Scholar
5. Grundy, P. J., Pollard, R. J. and Tomlinson, M. E., J. Magn. Magn. Mater. 126, 516 (1993).Google Scholar
6. Johnson, M. T., Coehoorn, R., Vries, J. J. de, McGee, N. W. E., Stegge, J. ann de and Bloemen, P. J., Phys. Rev. Lett. 68, 2688 (1992).Google Scholar
7. Greig, D., Hall, M. J., Hammond, C., Hickey, B. J., Ho, H. P., Howson, M. A., Walker, M. J., Weiser, N. and Wright, D. G., J. Magn. Magn. Mater. 110, L239 (1992).Google Scholar
8. Harp, G. R., Parkin, S. S. P., Farrow, R. F. C., Marks, R. F., Toney, M. F., Lam, Q. H., Rabedeau, T. A., Cebollada, A. and Savoy, R. J., MRS Symp. Proc. vol 313, p 41, 1993 and G. R. Harp, S. S. P. Parkin, R. F. C. Farrow, M. F. Toney, Q. H. Lam, T. A. Rabedeau and R. J. Savoy, Phys. Rev. B 47, 8721 (1993).Google Scholar
9. Kobayashi, Y., Aoki, Y., Sato, H., Kamijo, A. and Abe, M., J. Magn. Magn. Mater. 126, 501 (1993).Google Scholar
10. Miguel, J. J. de, Cebollada, A., Gallego, J. M., Miranda, R., Schneider, C. M., Schuster, P. and Kirschner, J., J. Magn. Magn. Mater., 93, 1 (1991).Google Scholar
11. Schreyer, A., Brohl, K., Ankner, J. F., Zeidler, Th., Bodeker, P., Metoki, N., Majkrzak, C. F. and Zabel, H., Phys. Rev. B 47, 15334 (1993).Google Scholar
12. Gradmann, U. and Elmers, H. J., J. Magn. Magn. Mater. 137, 44 (1994).Google Scholar
13. Lenczowski, S. J., Gijs, M. A. M., Giesbers, J. B., Veerdonk, R. J. M. van der and deJonge, W. J. M., Phys. Rev. B 50, 9982 (1994).Google Scholar
14. Kingetsu, T. and Yoshizaki, F., Jpn. J. Appl. Phys. 33, 2041 and 6168 (1994).Google Scholar
15. Schroeder, P.A., Lee, S.F., Holody, P., Loloee, R., Yang, Q., Pratt, W.P. jnr and Bass, J., J. Appl. Phys. 76, 6610 (1994).Google Scholar
16. Pollard, R.J., Wilson, M.J. and Grundy, P.J., in press, J. Magn. Magn. Mater.Google Scholar
17. Cohen, M.R., Simonson, R.J., Altamirano, M.M., Critchfield, K.L., Kemp, W.T. and Meinhardt, J.A., J. Vac. Sci. Tech. A11(4), 971 (1993).Google Scholar
18. Pirra, C., Peruchetti, J.C., Gewinner, G. and Derrier, J., Phys. Rev. B 29, 3391 (1984).Google Scholar
19. Brodde, A. and Neddermeyer, H., Ultramicroscopy 42–44, 556 (1992).Google Scholar