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The Microstructure of Sputtered Co-Cr Magnetic Recording Media

Published online by Cambridge University Press:  15 February 2011

Astrid Pundt ,
Ralf Busch  and
Carsten Michaelsen
Astrid Pundt
Affiliation:
Institut für Metallphysik, Hospitalstraße 3-7, D-37073 Göttingen, Germany
Ralf Busch
Affiliation:
Keck Laboratory of Engineering Materials, California Institute of Technology, Pasadena, CA 91125;
Carsten Michaelsen
Affiliation:
Institut fiir Werkstofforschung, GKSS-Forschungszentrum, D - 21502 Geesthacht, Germany
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Abstract

With the increase of magnetic storage capacity in view, sub grain decomposition in Co-Cr magnetic recording material is examined with the field ion microscope / atom probe (FIM/AP) on a nanometer scale. Concentration variations in sputtered 50 nm Co-20at% Cr and 3 μm Co-22at% Cr films are analysed. Layers with up to 50 nm thickness are sputtered directly onto tungsten FIM tips. FTM-tips of layers with up to 3 μm thickness are prepared by a lithography and etching technique. The measurements show decomposition on the scale of a few nanometers. The concentration amplitudes vary between 11 at% Cr and 42 at% Cr within 50 nm films. Within 3 μm films the concentration varies from about 10 at% Cr to 30 at% Cr. Furthermore, at grain boundaries 3–4 nm precipitates of about 40 at% Cr are observed. The observed concentrations depend on substrate temperature. The compositional inhomogeneity can be explained by a miscibihty gap in the hep phase solid solution which is induced by magnetism at low temperatures.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 343: Symposium H – Polycrystalline Thin Films - Structure, Texture, Properties and Applications , 1994 , 309
Copyright
Copyright © Materials Research Society 1994

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References

REFERENCES

[1] Iwasaki, S., Ouchi, K., IEEE Trans.Magn., MAG-14(5), 849 (1978)CrossRefGoogle Scholar
[2] Fisher, R.D., Au-Yeung, V.S., Sabo, B.B., IEEE Trans.Magn., MAG-20(5), 806 (1984)CrossRefGoogle Scholar
[3] Kobayashi, K., Ishida, G., J. Appl. Phys.52(3), 2453 (1981)CrossRefGoogle Scholar
[4] Maeda, Y., Hirono, S., Asahi, M., Jap.J.Appl.Phys. 24(12), L951 (1985)CrossRefGoogle Scholar
[5] Maeda, Y., Takahashi, M., IEEE Trans. Magn., MAG-24(6), 3012 (1988)CrossRefGoogle Scholar
[6] Parker, F.T., Oesterreicher, H., Fullerton, E., J. Appl. Phys.66(12), 5988 (1989)CrossRefGoogle Scholar
[7] Yoshida, K., Kakibayashi, H., Yasuoka, H., J.Appl.Phys.68(2), 705 (1990)CrossRefGoogle Scholar
[8] Geber, G.P., Al-Kassab, T., Isheim, D., Busch, R., Haasen, P., Z. Metallkd. 83, 449 (1992)Google Scholar
[9] Busch, R., Schneider, S. (these proceedings)Google Scholar
[10] Hasegawa, N., Hono, K., Okano, R., Fujimori, H., Sakurai, T., Appl.Surf.Sci.67(1–4), 407 (1993)CrossRefGoogle Scholar
[11] Wagner, R., Field-Ion Microscopy in Materials Science, in: Crystals, Vol.6, edited by Freyhardt, HC., Springer Verlag, Berlin 1982 CrossRefGoogle Scholar
[12] Kreyszig, E., Statistische Methoden und ihre Anwendungen. Vandenhoeck & Ruprecht Verlag Gtittingen 1965 Google Scholar
[13] Pundt, A., Isheim, D. (in preparation)Google Scholar
[14] Hasebe, M., Oikawa, K., Nishizawa, T., J. Jap. Inst. Met.,46(6), .577 (1982)CrossRefGoogle Scholar
[15] Green, A., Whittle, D.P., Stringer, J., Swindells, N., Scr. Met.7, 1079 (1973)CrossRefGoogle Scholar