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Microstructured Optical Fibers as New Nanotemplates for High Pressure CVD

Published online by Cambridge University Press:  26 February 2011

Neil Baril ,
John Badding ,
Pier Savio ,
Venkatraman Gopalan ,
Dong-Jin Won ,
Thomas Scheidemantel ,
Chris Finlayson ,
Adrian Amezcua-Correa  and
Bryan Jackson
Neil Baril
Affiliation:
nfb109@psu.edu, Penn State University, Chemistry, 104 Chemistry Building, University Park, PA, 16802, United States
John Badding
Affiliation:
jbadding@pearl.chem.psu.edu, Penn State University, Chemistry, University Park, PA, 16802, United States
Pier Savio
Affiliation:
P.A.Sazio@soton.ac.uk, University of Southampton, Southampton, SO17 1BJ, United Kingdom
Venkatraman Gopalan
Affiliation:
vxg8@psu.edu, Penn State University, Materials Science and Engineering, University Park, PA, 16802, United States
Dong-Jin Won
Affiliation:
duw117@psu.edu, Penn State University, Materials Science and Engineering, University Park, PA, 16802, United States
Thomas Scheidemantel
Affiliation:
txs120@psu.edu, Penn State University, Physics, University Park, PA, 16802, United States
Chris Finlayson
Affiliation:
cef26@cam.ac.uk, University of Southampton, Southampton, SO17 1BJ, United Kingdom
Adrian Amezcua-Correa
Affiliation:
aac@orc.soton.ac.uk, University of Southampton, Southampton, SO17 1BJ, United Kingdom
Bryan Jackson
Affiliation:
bjackson@rci.rutgers.edu, Penn State University, Materials Science and Engineering, University Park, PA, 16802, United States
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Abstract

Solid state chemists have long been interested in templated growth of materials using many approaches. The resulting materials have been useful in areas as diverse as photonics and catalysis. Microstructured optical fibers (MOFs) form a new class of nanotemplates that can have sub 20 nm pores that are meters to kilometers long. We have developed a high-pressure microfluidic chemical process that allows for conformal deposition of materials within MOFs to form the most extreme aspect ratio semiconductor nanowires known. The wires can be spatially organized with respect to each other at dimensions down to the nanoscale because the MOF templates can be designed with almost any desired periodic or aperiodic pattern. Many if not most of the chemistries used for conventional chemical vapor deposition (CVD) can be adapted for this process. The resulting materials should enable a large range of scientific and technological applications.

Keywords

chemical vapor deposition (CVD) (deposition)SiGe
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 988: Symposium QQ – Solid-State Chemistry of Inorganic Materials VI , 2006 , 0988-QQ04-02
Copyright
Copyright © Materials Research Society 2007

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