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Millimeter-scale surface nano-structuring using focused ion beam milling

Published online by Cambridge University Press:  26 February 2011

Katharine Dovidenko ,
Radislav A. Potyrailo  and
Laurie A. Le Tarte
Katharine Dovidenko
Affiliation:
dovidenk@research.ge.com, GE Global Research Center, 1 Research Circle, Niskayuna, NY, 112309, United States
Radislav A. Potyrailo
Affiliation:
potyrailo@research.ge.com, GE Global Research Center, United States
Laurie A. Le Tarte
Affiliation:
letarte@crd.ge.com, GE Global Research Center, United States
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Abstract

New patterning schemes for a variety of applications including sensors and photonics are explored. We present here a comprehensive study of using focused ion beam (FIB) milling to modify surfaces over millimeter-scale areas with nano-patterns of dimensions down to 30 nm. A typical example of a pattern is 40 nm diameter × 40 nm depth wells with a 200 nm pitch. Typical sample materials are metals, but polymer patterning is possible. We have also evaluated the surface of the patterned materials to ensure there are no negative effects of these patterning schemes on the future device performance.

Keywords

ion-beam processingsurface chemistryAuger electron spectroscopy (AES)
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 901: Symposium R – Assembly at the Nanoscale – Toward Functional Nanostructured Materials , 2005 , 0901-Ra05-16-Rb05-16
Copyright
Copyright © Materials Research Society 2006

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References

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