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Molecular relaxation in Chitosan films in GHz frequency range

Published online by Cambridge University Press:  10 February 2014

Siva Kumar-Krishnan ,
Evgen Prokhorov  and
Gabriel Luna-Barcenas
Siva Kumar-Krishnan
Affiliation:
CINVESTAV-Queretaro, Libramiento Norponiente 2000, Queretaro, QRO 76230, MEXICO
Evgen Prokhorov
Affiliation:
CINVESTAV-Queretaro, Libramiento Norponiente 2000, Queretaro, QRO 76230, MEXICO
Gabriel Luna-Barcenas
Affiliation:
CINVESTAV-Queretaro, Libramiento Norponiente 2000, Queretaro, QRO 76230, MEXICO
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Abstract

The molecular relaxations behavior of chitosan (CS) films in the wide frequency range of 0.1-3x109 Hz (by using three different impedance analyzers) have been investigated in the temperature range of -100C to 120°C using Dielectric Spectroscopy (DS). Additionally to the low frequency molecular relaxations such as α and β relaxations, for the first time, high frequency (1-3 GHz) relaxation process has been observed in the chitosan films. This relaxation exhibits Arrhenius-type dependence in the temperature range of -100 C to 54°C with negative activation energy -2.7 kJ/mol. At temperatures above 54°C, the activation energy changes from -2.7 kJ/mol to +4.4 kJ/mol. Upon cooling, the activation energy becomes negative again with a value of -1.2 kJ/mol. The bound water between chitosan molecules strongly modifies molecular motion and the relaxation spectrum, giving rise to a new relaxation at the frequency at ca. 1 GHz. In situ FTIR analysis has shown that this relaxation related to the changes in vibration of the –OH, NH and –CO functional groups.

Keywords

dielectricdielectrical propertiesfilm
Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1613: Symposium 4D – New Trends in Polymer Chemistry and Characterization-2013 , 2014 , pp. 83 - 88
Copyright
Copyright © Materials Research Society 2014 

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References

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