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Monitoring and Control in Vapor phase Epitaxy

Published online by Cambridge University Press:  10 February 2011

T. P. Pearsall
T. P. Pearsall*
Affiliation:
Dept. of Materials Science and Engineering, University of Washington, Seattle, WA, 98195
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Abstract

Monitoring and control in epitaxy based on chemical vapor deposition is a challenge created by growth conditions that often preclude more common sensors like thermocouples and mass spectrometry. We report results of experiments to measure and control temperature and flux by non-invasive optical sensing. We have developed a temperature control system with precision and accuracy better that 5°C. Satisfactory control of flux poses difficulties that will require innovative solutions before a useful control system can be developed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 502: Symposium II – In Situ Process Diagnostics & Intelligent Materials Processing , 1997 , 117
Copyright
Copyright © Materials Research Society 1998

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References

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