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Nanoscratch Deformation Response of Carbon Nitride Thin Films

Published online by Cambridge University Press:  17 March 2011

C. Charitidis ,
P. Patsalas  and
S. Logothetidis
C. Charitidis
Affiliation:
Department of Physics, Aristotle University of Thessaloniki, 54006 Thessaloniki, Greece
P. Patsalas
Affiliation:
Department of Physics, Aristotle University of Thessaloniki, 54006 Thessaloniki, Greece
S. Logothetidis
Affiliation:
Department of Physics, Aristotle University of Thessaloniki, 54006 Thessaloniki, Greece
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Abstract

The mechanical performance of thin carbon nitride (CNx) films deposited onto Si(100) substrate by sputtering, was investigated in the load range of 2-20 mN using nanoindentation and nanoscratch techniques. The microstructure of these films was characterized by the inhomogeneous embedding of crystalline grains into a N-poor amorphous matrix. A load dependent transition was found in both the scratch, as well as the friction responses. Below 5 mN, nanoscratching showed completely elastic behavior of the film, while above 10 mN a mixed elastic-plastic behavior was identified. Testing under a normal load of 20 mN resulted in local grooving at the film surface; however, in-situ profiling of the scratch trace showed no evidence of film failure. Both the coefficient of friction (μ), as well as the plastic deformation of the films were found increasing with the normal load applied following an exponential low.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 649: Symposium Q – Fundamentals of Nanoindentation & Nanotribology II , 2000 , Q7.19
Copyright
Copyright © Materials Research Society 2001

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References

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