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New Method of Computing Band Offsets and Its Application to AlGaN/GaN Heterostructures

Published online by Cambridge University Press:  10 February 2011

Richard T. Webster  and
A. F. M. Anwar
Richard T. Webster
Affiliation:
Air Force Research Laboratory, Hanscom AFB, MA 01730
A. F. M. Anwar
Affiliation:
Electrical and Systems Engineering Department, University of Connecticut, Storrs, CT 06269
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Abstract

Calculated sheet carrier concentration as a function of Al mole fraction in the quantum well (QW) formed at the GaN/AlGaN heterointerface is calculated and compared to experimental data. Close agreement between experiment and theory is observed. The calculated sheet carrier concentration reflects the maximum carrier concentration possible in the GaN QW for a given Al mole fraction and can not be used to argue in favor of either interface charge or piezoelectric effect as giving rise to the carriers. Based on experimental data the charge density in the AlGaN layer is estimated to be 4 × 1012cm-2

The calculations are based upon a simple technique to determine valence band alignments. Calculated values are compared to experimental data showing excellent agreement. A calculated valence band discontinuity of 0.42eV for AlN/GaN is well within the experimental bounds.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 482 , 1997 , 929
Copyright
Copyright © Materials Research Society 1998

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