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Novel Studies of Roughening of the Prism Plane of Ice

Published online by Cambridge University Press:  14 March 2011

Ann-Marie Williamson
Affiliation:
Unilever Research Colworth, Colworth House, Sharnbrook, Bedford, MK44 1LQ, UK
Alex Lips
Affiliation:
Unilever Research Colworth, Colworth House, Sharnbrook, Bedford, MK44 1LQ, UK
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Abstract

A novel technique for examining kinetic roughening of crystals is described, and applied to the study of the prism plane of ice in contact with aqueous fructose solution. The technique can be generally applied to crystals that roughen at low driving forces. Since the residual driving force for growth utilised is that due to Ostwald ripening, this technique also facilitates simultaneous quantification of ensemble growth kinetics and crystal anisotropy during ripening. The driving force required for kinetic roughening, and the step, or ledge, free energy of this plane of ice show an approximately linear variation with temperature over the experimental temperature range −13°C to −17°C. Whilst we can conclude that the thermodynamic roughening temperature (TR) is higher than −13°C, its precise value, and conformance or otherwise of the roughening transition with Kosterlitz Thouless scaling, can not be concluded from the current data set.

Type
Research Article
Copyright
Copyright © Materials Research Society 2000

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References

REFERENCES

1. Maruyama, M., Nishida, T., Sawada, T., J. Phys. Chem. B, 101, 6151 (1997).Google Scholar
2. Maruyama, M., Kishimoto, Y., Sawada, T., J. Crystal Growth, 172, 521 (1997).Google Scholar
3. Williamson, A.- M., Lips, A., Clark, A., Hall, D.G., Faraday Discussions, 112, 31 (1999).Google Scholar
4. Lifshitz, I.M., Slyozov, V.V., J. Phys. Chem. Solids, 19, 35 (1961).Google Scholar
5. Bhakta, A., Ruckenstein, E., J. Chem. Phys., 103, 7120 (1995).Google Scholar
6. Marqusee, J.A., Ross, J., J. Chem. Phys., 79(1), 373 (1983).Google Scholar
7. Veenendaal, E. van, Hoof, P.J.C.M. van, Suchtelen, J. van, Enckevort, W.J.P. van, Bennema, P., Surf. Sci., 417, 121 (1998).Google Scholar
8. Gallet, F., Nozières, P., Balibar, S., Rolley, E., Europhys. Lett., 2, 701 (1986).Google Scholar
9. Jörgenson, L., Harris, R., Phys. Rev. E, 47, 3504 (1993).Google Scholar
10. Liu, X.- Y., Hoof, P. van, Bennema, P., Phys Rev. Lett, 71, 97 (1993).Google Scholar
11. Kosterlitz, J.M., Thouless, D.J., J. Phys. C, 6, 1181 (1973).Google Scholar
12. Wortis, M., in Chemistry and Physics of Solid Surfaces VII, eds. Vanselow, R. & Howe, R., Springer Verlag, Berlin (1988).Google Scholar
13. Williamson, A.- M., Lips, A., Unpublished work.Google Scholar