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Nucleation and Growth of Defects in He irradiated Fe using Rate Theory and Kinetic Monte Carlo Methods

Published online by Cambridge University Press:  26 February 2011

Christophe Juan Ortiz ,
Maria Jose Caturla ,
Chu Chun Fu  and
Francois Willaime
Christophe Juan Ortiz
Affiliation:
christophe.ortiz@ua.es, University of Alicante, Fisica Aplicada, Carretera San Vicent del Raspeig s/n, Alicante, Alicante, 03690, Spain, 0034965909599
Maria Jose Caturla
Affiliation:
mj.caturla@ua.es, University of Alicante, Departamento de Fisica Aplicada, Spain
Chu Chun Fu
Affiliation:
chuchun@cea.fr, CEA/Saclay, Service de Recherches de Métallurgie Physique, France
Francois Willaime
Affiliation:
fwillaime@cea.fr, CEA/Saclay, Service de Recherches de Métallurgie Physique, France
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Abstract

He desorption in Fe was studied using rate theory and kinetic Monte Carlo models. A good fit to experimental observations was obtained with a migration energy of 1.1 eV and a formation energy of 1.6 eV for the single vacancy. These results could be explained by the presence of traps/impurities in experiments. Simulations show that the release of He during annealing is mainly due to the dissociative mechanism (Frank-Turnbull) and the release of Hei from He-V clusters.

Keywords

defectsdiffusionHe
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 908: Symposium OO – Growth, Modification, and Analysis by Ion Beams at the Nanoscale , 2005 , 0908-OO05-22
Copyright
Copyright © Materials Research Society 2006

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References

1 Vassen, R., Trinkaus, H. and Jung, P., Phys. Rev. B 44, 4206 (1991).Google Scholar
2 Sugano, R., Morishita, K., Ikawiri, H. and Yoshida, N., J. Nuc. Mat. 307–311, 941 (2002).Google Scholar
3 Fu, Chu-Chun, Torre, J. Dalla, Willaime, F. et al. , Nature Materials 4, 68 (2005).Google Scholar
4 Sadigh, B., Lenosky, T. J., Theiss, Silva K. et al. , Phys. Rev. Lett. 83, 4341 (1999).Google Scholar
5 Fu, C. C. and Willaime, F., Phys. Rev. B 72, 064117 (2005).Google Scholar
6 Biersack, J. P., Electrochem. Soc. Proc. 93–6, 509 (1993).Google Scholar
7 Domain, C., Becquart, C. S., Phys. Rev. B 65, 024103 (2001).Google Scholar
8 Wirth, B. D., Odette, G. R., Maroudas, D., Lucas, G. E., J. Nucl. Mat. 276, 33 (2000).Google Scholar
9 Soneda, N., Rubia, T. Diaz de la, Phil Mag. A 78 (1998) 995–1019 Google Scholar
10 Osetsky, Yu. N., Bacon, D. J., Serra, A., Singh, B. N., Golubov, S. I., Phil. Mag. 83, 61 (2003).Google Scholar
11 Duparc, A. Hardouin and Barbu, A., MRS Symp. Proc. 439, 509 (1997).Google Scholar
12 Domain, C., Becquart, C. S. and J. Foct, Phys. Rev. B 69, 144112 (2004).Google Scholar
13 Fu, C. C. and Willaime, F., to be published.Google Scholar