Hostname: page-component-745bb68f8f-d8cs5 Total loading time: 0 Render date: 2025-02-05T21:28:40.743Z Has data issue: false hasContentIssue false
  • English
  • Français

Numerical Analysis of an Impinging Jet Reactor for the CVD and Gas-Phase Nucleation of Titania

Published online by Cambridge University Press:  15 February 2011

Suleyman A. Gokoglu ,
G. D. Stewart ,
J. Collins  and
D. E. Rosner
Suleyman A. Gokoglu
Affiliation:
NASA Lewis Research Center, Cleveland, OH 44135
G. D. Stewart
Affiliation:
Ohio Aerospace Institute, Brook Park, OH 44142
J. Collins
Affiliation:
Chemical Eng. Dept., Yale University, New Haven, CT 06520-8286
D. E. Rosner
Affiliation:
Chemical Eng. Dept., Yale University, New Haven, CT 06520-8286
Get access

Abstract

We model a cold-wall atmospheric pressure impinging jet reactor to study the CVD and gas-phase nucleation of TiO2 from a titanium tetra-iso-propoxide (TTIP)/oxygen dilute source gas mixture in nitrogen. The mathematical model uses the computational code FIDAP and complements our recent asymptotic theory for high activation energy gas-phase reactions in thin chemically reacting sublayers. The numerical predictions highlight deviations from ideality in various regions inside the experimental reactor. Model predictions of deposition rates and the onset of gas-phase nucleation compare favorably with experiments. Although variable property effects on deposition rates are not significant (∼11% at 1000K), the reduction of rates due to Soret transport is substantial (∼75% at 1000K).

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 335: Symposium Y – Metal-Organic Chemical Vapor Deposition of Electronic Ceramics , 1993 , 171
Copyright
Copyright © Materials Research Society 1994

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

6. References

1. Rosner, D. E., Collins, J. and Castillo, J. L., Proc. Twelfth Int. Symp. on Chemical Vapor Deposition, edited by Jensen, K. F. and Cullen, G. W., Proc. Vol. 93–2 (The Electrochem. Soc., Pennington, NJ, 1993), p. 41; also J. L. Castillo and D. E. Rosner, Yale Univ., HTCRE Lab. Publ. #196, June 1993, to be submitted.Google Scholar
2. Collins, J., Rosner, D. E., and Castillo, J., in Chemical Vapor Deposition of Refractory Metals and Ceramics II, edited by Besmann, T. M., Gallois, B. M. and Warren, J. W. (Mater. Res. Soc. Symp. Proc., 250, 1992) pp. 53.Google Scholar
3. Collins, J., PhD Dissertation, Yale University, Department of Chemical Engineering, in preparation, 1993.Google Scholar
4. Okuyama, K., et al. , AIChE J. 36 (3), 409 (1990).Google Scholar
5. Stewart, G. D., et al. , in preparation, 1993.Google Scholar
6. Rosner, D. E.,Transport Processes in Chemically Reacting Flow Systems, Butterworth-Heinemann, Stoneham, MA, 3rd Print, 1990.Google Scholar
7. Siefering, K. L. and Griffin, G. L., J. Electrochem. Soc. 137 (3), 814 (1990); J. Electrochem. Soc., 137 (4), 1206 (1990).Google Scholar