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Numerical Simulation of the Growth of ZnO Nanostructures in a Tube Furnace by Physical Vapour Deposition

Published online by Cambridge University Press:  01 February 2011

Sharvari Dalal ,
Federico Gallo ,
Andrew J Flewitt  and
William I Milne
Sharvari Dalal
Affiliation:
shd21@cam.ac.uk, University of Cambridge, Electrical Engineering, 9 JJ Thomson Avenue, Cambridge, CB1 2XL, United Kingdom
Federico Gallo
Affiliation:
federico.gallo1@gmail.com, Ravensworth Gardens, Cambridge, CB1 2XL, United Kingdom
Andrew J Flewitt
Affiliation:
ajf@eng.cam.ac.uk, University of Cambridge, Electrical Engineering, 9 JJ Thomson Avenue, Cambridge, CB3 0FA, United Kingdom
William I Milne
Affiliation:
wim@eng.cam.ac.uk, University of Cambridge, Electrical Engineering, 9 JJ Thomson Avenue, Cambridge, CB3 0FA, United Kingdom
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Abstract

Zinc oxide is a versatile II-VI naturally n-type semiconductor that exhibits piezoelectric properties. By controlling the growth kinetics during a simple carbothermal reduction process a wide range of 1D nanostructures such as nanowires, nanobelts, and nanotetrapods have been synthesized. The driving force for the nanostructure growth is the Zn vapour supersaturation and supply rate which, if known, can be used to predict and explain the type of crystal structure that results. A model which attempts to determine the Zn vapour concentration as a function of position in the growth furnace is described. A numerical simulation package, COMSOL, was used to simultaneously model the effects of fluid flow, diffusion and heat transfer in a tube furnace made specifically for ZnO nanostructure growth. Parameters such as the temperature, pressure, and flow rate are used as inputs to the model to show the effect that each one has on the Zn concentration profile. An experimental parametric study of ZnO nanostructure growth was also conducted and compared to the model predictions for the Zn concentration in the tube.

Keywords

Znchemical vapor deposition (CVD) (deposition)simulation
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1074: Symposium I – Synthesis and Metrology of Nanoscale Oxides and Thin Films , 2008 , 1074-I05-06
Copyright
Copyright © Materials Research Society 2008

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References

REFERENCES

1. Dalal, S. H. Baptista, D. L. Teo, K. B. K. Lacerda, R. G. Jefferson, D. A. and Milne, W. I. Nanotechnology 17, 4811 (2006).Google Scholar
2. Acheson, DJ. Elementary Fluid Dynamics. (Oxford University Press, Oxford 1990).Google Scholar
3. O'Hanlon, JF. A user's guide to vacuum technology. (Wiley-Interscience, New Jersey, 1937).Google Scholar
4. Smith, D. Thin Film Deposition Principles and Practice. (McGraw Hill Inc, Boston, 1995).Google Scholar
5. Sharipov, F and Seleznev, V. Journal of Physical and Chemical Reference Data, 27, 657(1998).Google Scholar
6. Batchelor, GK. An Introduction to Fluid Dynamics. (Cambridge University Press, Cambridge 2002).Google Scholar
7. Obert, EF. Industrial & Engineering Chemistry, 40, 2185 (1948).Google Scholar
8. Perry, RH and Green, DW. Perry's Chemical Engineers' Handbook. (New York, McGraw-Hill Book, 1997).Google Scholar
9. Mason, EA and Malinauskas, AP. Gas Transport in Porous Media: The Dusty-gas Model. (Elsevier, Amsterdam, 1983).Google Scholar
10. Ye, C, Fang, X. Hao, Y, Teng, X, and Zhang, L.. J. Phys. Chem. B, 109, 19758 (2005).Google Scholar
11. Banerjee, D, Lao, JY, Wang, DZ, Huang, JY, Ren, ZF, Steeves, D, Kimball, B, and Sennett, M. Applied Physics Letters. 83, 2061 (2003).Google Scholar
12. Huang, Samuel, MHM, H Feick, Yan, H, Wu, Y, Kind, H, Weber, E, Russo, R, and Yang, P. Science. 292, 1897 (2001).Google Scholar
13. Fan, HJ, Fleischer, F, Lee, W, Nielsch, K, Scholz, R, Zacharias, M, Gosele, U, Dadgar, A, and Krost, A. Superlattices and Microstructures. 36, 95 (2004).Google Scholar
14. Yang, PD, Yan, HQ, Mao, S, Russo, R, Johnson, J, Saykally, R, Morris, N, Pham, J, He, RR, and Choi, H J. Advanced Functional Materials. 12, 323 (2002).Google Scholar
15. Fan, Z, Wang, D, Chang, PC, Tseng, WY, and Lu, JG. Applied Physics Letters. 85, 5923 (2004).Google Scholar