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The Optical Properties of Plasma-Deposited SiO2 and Si3N4 Bragg Reflectors in the Spectral Range from 1.8 to 3.0 eV

Published online by Cambridge University Press:  25 February 2011

D. J. Stephens ,
S. S. He ,
G. Lucovsky ,
H. Mkkelsen ,
K. Leo  and
H. Kurz
D. J. Stephens
Affiliation:
Departments of Physics, North Carolina State University, Raleigh NC 27695–8202, USA
S. S. He
Affiliation:
Departments of Physics, North Carolina State University, Raleigh NC 27695–8202, USA
G. Lucovsky
Affiliation:
Departments of Physics, North Carolina State University, Raleigh NC 27695–8202, USA
H. Mkkelsen
Affiliation:
Rheinisch-Westfälische Technische Hochschule, 5100-Aachen, Germany
K. Leo
Affiliation:
Rheinisch-Westfälische Technische Hochschule, 5100-Aachen, Germany
H. Kurz
Affiliation:
Rheinisch-Westfälische Technische Hochschule, 5100-Aachen, Germany
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Abstract

We have prepared 19-layer Si3N4:SiO2/…‥Si3N4:SiO2/Si3N4 (HL/HL/…HL/H), Bragg reflectors by remote plasma-enhanced chemical-vapor deposition, and have adjusted the constituent layer thicknesses to generate highly reflecting films over the entire visible spectrum from approximately 1.8 eV (∼690 nm) to 3.0 eV (∼410 nm). Peak values of the reflectance, in spectral bands with half-widths of ∼0.4 to 0.5 eV, are in the range of 96 to 98 %. The spectral response functions of these stacks exhibit departures from the optical behavior as calculated for exactly periodic structures with λ/4 layer thicknesses, and can be accounted for by taking into account: i) dispersion and absorption in the optical properties of the constituent layers; and ii) departures from the idealized and constant layer thicknessses.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 281: Symposium D – Semiconductor Heterostructures for Photonic and Electronic Applications , 1992 , 809
Copyright
Copyright © Materials Research Society 1993

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References

REFERENCES

[1] Stephens, D.J., He, S.S., Lucovsky, G., Mikkelsen, H., Leo, K. and Kurz, H., J. Vac. Sci. Technol. A11 (1993), in press.Google Scholar
[2] Born, M. and Wolf, E., “Principles of Optics”, (Pergamon Press, London, 1964), pp. 51–70.Google Scholar
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[4] Lucovsky, G., Tsu, D.V., Rudder, R.A. and Markunas, R.J., in “Thin Film Processes II”, Ed. by Vossen, J.L. and Kern, W., (Academic Press, Boston, 1991), Chapter IV-2.Google Scholar
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