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Performances Presented by Large Area ZnO Thin Films Deposited by Spray Pyrolysis

Published online by Cambridge University Press:  17 March 2011

Patrícia Nunes ,
Antonio Marques ,
Elvira Fortunato  and
Rodrigo Martins
Patrícia Nunes
Affiliation:
Department of Materials Science/CENIMAT, Faculty of Sciences and Technology, New University of Lisbon and CEMOP-UNINOVA, 2825-114 Caparica, Portugal
Antonio Marques
Affiliation:
Department of Materials Science/CENIMAT, Faculty of Sciences and Technology, New University of Lisbon and CEMOP-UNINOVA, 2825-114 Caparica, Portugal
Elvira Fortunato
Affiliation:
Department of Materials Science/CENIMAT, Faculty of Sciences and Technology, New University of Lisbon and CEMOP-UNINOVA, 2825-114 Caparica, Portugal
Rodrigo Martins
Affiliation:
Department of Materials Science/CENIMAT, Faculty of Sciences and Technology, New University of Lisbon and CEMOP-UNINOVA, 2825-114 Caparica, Portugal
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Abstract

In this work we present the results of a study on the uniformity of ZnO thin films produced by spray pyrolysis. The properties of the thin films depend essentially on the carrier gas pressure and gas flow used. The best films for optoelectronic applications were obtained with a carrier gas pressure of 2 bar and solution flow of 37 ml/min. The velocity of the nozzle affects essentially the uniformity of the ZnO thin films. However this important characteristic of the large area thin films is independent of the nature (doped and undoped) of the thin film and exhibits a high dependence on the variation of the temperature along the substrate.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 685: Symposium D – Advanced Materials and Devices for Large-Area Electronics , 2001 , D5.13.1
Copyright
Copyright © Materials Research Society 2001

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References

[1] Major, S., Chopra, K.L., Solar Energy Materials 17, 319 (1988).Google Scholar
[2] Belghit, K., Subhan, M.A., Rulhe, U., Duchemin, S., Bougnot, J., Proceeding 10th European Photovoltaic Solar Energy Conference, 613 (1991).Google Scholar
[3] Michel, H.J., Leiste, H., Schierbaum, K.D., Halbritter, J., Applied Surface Science 126, 57 (1998).Google Scholar
[4] Tiburcio-Silver, A., Joubert, J.C., Labeau, M., J.Phys.III 2, 1287 (1992).Google Scholar
[5] Messaoudi, C., Abd-Lefdil, S., Sayah, D. and Cadene, M., Eur. Phys. J. AP 1, 181 (1998).Google Scholar
[6] Hartnagel, H.L., Dawar, A.L., Jain, A.K., Jagadish, C., in: Semiconducting transparent thin films, Institute of Physics Publishing (1995).Google Scholar
[7] Major, S., Chopra, K.L., Solar Energy Materials 17, 319 (1988).Google Scholar
[8] Tiburcio-Silver, A., Joubert, J.C., Labeau, M., Thin Solid Films 197, 195 (1991).Google Scholar
[9] Malik, A., Sêco, A., Nunes, R., Vieira, M., Fortunato, E., Martins, R., Mat. Res. Soc. Symp, 471 47 (1997).Google Scholar
[10] Major, S., Banerjee, A. and Chopra, K.L., Thin Solid Films 2, 333 (1983).Google Scholar