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Photoluminescence Investigation of Dislocation-Related Defects in High Purity Silicon

Published online by Cambridge University Press:  26 February 2011

A. T. Hunter
Affiliation:
Hughes Research Laboratories, 3011 Malibu Canyon Road, Malibu, CA 90265
Kimberly L. Schumacher
Affiliation:
Hughes Research Laboratories, 3011 Malibu Canyon Road, Malibu, CA 90265
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Abstract

We conducted a luminescence investigation of the D1-D4 luminescence lines (0.8 to 1.0 eV) in three samples of high-purity, float-zone silicon. We conclude that the D3 line is a transverse-optical-phonon replica of the D4 line. In the samples studied, all of the defects were formed in the bulk of the crystals by high temperature thermal stress. The free-exciton lifetimes are short, varying between ∼20 nsec at a dislocation density of 1 × 106 cm−2 to ∼200 nsec at a density of 7 × 104 cm−2. The D4 decay shows a small temperature dependence, and varies between samples.

Type
Research Article
Copyright
Copyright © Materials Research Society 1987

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References

REFERENCES

1. Drozdov, N. A., Patrin, A. A., Tkachev, V. D., Phys. Stat. Sol.(b) 83, K137 (1977).Google Scholar
2. Suezawa, M. and Sumino, K., Phys. Stat. Sol.(a) 78, 639 (1983).Google Scholar
3. Sauer, R., Weber, J., Stolz, J., Weber, E. R., Kusters, K.-H., and Alexander, H., Appl. Phys. A36, 1 (1985)Google Scholar
4.See, for example, Tajima, M., Appl. Phys. Lett. 32, 719 (1978). For the concentrations quoted here, we used our own calibrations, based on concentrations determined by analysis of temperature dependent Hall data, to obtain 8 and P concentrations by luminescence.Google Scholar
5. Jenkins, M. W., J. Electrochem. Soc. 124 (5), 757762 (1977).Google Scholar
6. Rozgonyi, G.A. and Kushner, R.A., J. Electrochem. Soc. 123 (4), 570 (1976).Google Scholar
7. d'Aragona, F. Secco, J. Electrochem. Soc., 119 (7), 948 (1972).Google Scholar
8. Sauer, R., Alexander, H., and Kisielowski-Kemmerich, C., to be published in Proc. of the 14th Int. Conf. on Defects in Semiconductors, (Trans Tech Publications, Aedermannsdorf, 1987).Google Scholar