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Preparation of Smooth Zinc Oxide Thin Film via Liquid Phase Reaction with Cation Additives

Published online by Cambridge University Press:  15 March 2011

Takeyasu Saito ,
Yoshihisa Hirata ,
Naoki Okamoto  and
Kazuo Kondo
Takeyasu Saito
Affiliation:
Department of Chemical Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Naka-ku, Sakai 599-8531, Japan
Yoshihisa Hirata
Affiliation:
Department of Chemical Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Naka-ku, Sakai 599-8531, Japan
Naoki Okamoto
Affiliation:
Department of Chemical Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Naka-ku, Sakai 599-8531, Japan
Kazuo Kondo
Affiliation:
Department of Chemical Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Naka-ku, Sakai 599-8531, Japan
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Abstract

ZnO thin films were deposited in a solution with Zn(NO3)2 and DMAB from 60 to 80°C. The effects of cation additives such as Mg, Ga and Al in a aqueous solution were investigated on surface morphology, crystallographic structure and growth rate. By adding 1E−4 mol/l of Ga or Al, the growth rate was enhanced from 0.13 m/h to 0.35-0.38 m/h. In addition, the surface morphology became flat in the case of Al addition.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1113: Symposium F – Low-Cost Solution-Based Deposition of Inorganic Films for Electronic/Photonic Devices , 2008 , 1113-F03-26
Copyright
Copyright © Materials Research Society 2009

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