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Real-Time Diagnosis of Etching and Deposition Processes by Spectroscopic Ellipsometry

Published online by Cambridge University Press:  21 February 2011

D. E. Aspnes  and
R. P. H. Chang
D. E. Aspnes
Affiliation:
Bell Communications Research, 600 Mountain Avenue, Murray Hill, NJ 07974
R. P. H. Chang
Affiliation:
AT&T Bell Laboratories, 600 Mountain Avenue, Murray Hill, NJ 07974
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Abstract

Recent advances in instrumentation and data analysis have made spectroscopic ellipsometry a routine analytic tool with submonolayer sensitivity for monitoring and controlling cleaning, etching, deposition, or other processes that take place in relatively high-pressure or reactive environments. We discuss representative applications in chemical etching, plasma processing, and MOCVD to illustrate analytical procedures and to indicate other potential uses of the technique. The possibility of extracting surface information already carried in the polarization state of the processing laser beam is also discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 29: Symposium I – Laser-Controlled Chemical Processing of Surfaces , 1983 , 217
Copyright
Copyright © Materials Research Society 1984

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References

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