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Refrigerative Stereolithography Using Sol-Gel Transformable Photopolymer Resin and Direct Masking*

Published online by Cambridge University Press:  10 February 2011

T. Murakami ,
A. Kamimura  and
N. Nakajima
T. Murakami
Affiliation:
Department of Engineering Synthesis, The University of Tokyo Hongo 7-3-1, Bunkyo-ku, Tokyo 113-8656, Japan, murakami@mech.t.u-tokyo.ac.jp
A. Kamimura
Affiliation:
Department of Engineering Synthesis, The University of Tokyo Hongo 7-3-1, Bunkyo-ku, Tokyo 113-8656, Japan, murakami@mech.t.u-tokyo.ac.jp
N. Nakajima
Affiliation:
Department of Engineering Synthesis, The University of Tokyo Hongo 7-3-1, Bunkyo-ku, Tokyo 113-8656, Japan, murakami@mech.t.u-tokyo.ac.jp
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Abstract

The authors have been studying a new fabrication method termed “refrigerative stereolithography” which uses a gel resin layer instead of a liquid layer as in conventional stereolithography. This paper proposes the “direct masking method” in which a masking pattern is drawn to block direct light exposure to the surface of the gel resin layer. With such masks, we can avoid surplus growth only in the regions where it is unnecessary to improve height direction accuracy and resolution. Also, we can solidify the required section shape selectively using the masks and a lamp instead of laser scan patterns. The effectiveness of refrigerative stereolithography with the direct masking method is discussed and confirmed by some experimental results.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 625: Symposium Y – Solid Freeform & Additive Fabrication – 2000 , 2000 , 91
Copyright
Copyright © Materials Research Society 2000

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Footnotes

*

This work was done as a doctoral re search of the second author.

References

1 Murakami, T., Kamimura, A. and Nakajima, N., Refrigerative Stereolithography for Rapid Product Prototyping, Proc. of the 8th Int. Conf. on Production Eng., (1997) pp. 73–82.Google Scholar
2 Kamimura, A., Murakami, T. and Nakajima, N., Refrigerative Stereolithography for Support-Free and Accurate Fabrication, 10th Annual Solid Freeform Fabrication Symposium, (1999) pp.583–590.Google Scholar
3 Watanabe, T., Matsumura, A. and Ukachi, T., Study on Spectral Sensitivity of Resins for Stereolithography, Proc. of RadTech Asia ‘95, (1995) pp.301–306.Google Scholar
4 Jacobs, P. F., Rapid Prototyping & Manufacturing: Fundamentals of Stereolithography, (Society of Manufacturing Engineers, 1992) pp.416–419 Google Scholar