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Resistance Non-volatile Memory – RRAM

Published online by Cambridge University Press:  01 February 2011

Alex Ignatiev
Affiliation:
Ignatiev@uh.edu, University of Houston, Center for Advanced Materials, 4800 Calhoun Road, Houston, TX, 77204, United States
Naijuan Wu
Affiliation:
naijwu@uh.edu, University of Houston, Center for Advanced Materials, 4800 Calhoun Road, Houston, TX, 77204, United States
Xin Chen
Affiliation:
xinchen73@hotmail.com, University of Houston, Center for Advanced Materials, 4800 Calhoun Road, Houston, TX, 77204, United States
Yibo Nian
Affiliation:
YNian@UH.EDU, University of Houston, Center for Advanced Materials, 4800 Calhoun Road, Houston, TX, 77204, United States
Christina Papagianni
Affiliation:
ignatiev@uh.edu, University of Houston, Center for Advanced Materials, 4800 Calhoun Road, Houston, TX, 77204, United States
Shangqing Liu
Affiliation:
emailtosqliu@yahoo.com, University of Houston, Center for Advanced Materials, 4800 Calhoun Road, Houston, TX, 77204, United States
John Strozier
Affiliation:
John.Strozier@esc.edu, University of Houston, Center for Advanced Materials, 4800 Calhoun Road, Houston, TX, 77204, United States
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Abstract

Electric-pulse induced resistance (EPIR) change effect encompasses the reversible change of resistance of a thin oxide film under the application of short, low voltage pulses. The phenomenon is widely observed in complex and binary oxides, and is the basis for development of non-volatile resistance random access memory (RRAM). A variety of analytical techniques have been employed to understand the origin of the resistance change with recent data yielding a model incorporating oxygen ion/vacancy diffusion and pile-up near the interface region of the oxide at the impervious metal interface. Further efforts are still required to fine tune the model and apply it to the optimization of RRAM device development.

Type
Research Article
Copyright
Copyright © Materials Research Society 2007

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