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Resistance Non-volatile Memory – RRAM
Published online by Cambridge University Press: 01 February 2011
Abstract
Electric-pulse induced resistance (EPIR) change effect encompasses the reversible change of resistance of a thin oxide film under the application of short, low voltage pulses. The phenomenon is widely observed in complex and binary oxides, and is the basis for development of non-volatile resistance random access memory (RRAM). A variety of analytical techniques have been employed to understand the origin of the resistance change with recent data yielding a model incorporating oxygen ion/vacancy diffusion and pile-up near the interface region of the oxide at the impervious metal interface. Further efforts are still required to fine tune the model and apply it to the optimization of RRAM device development.
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- Copyright © Materials Research Society 2007