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The Role of Roughness in Texture Development

Published online by Cambridge University Press:  15 February 2011

J. F. Whitacre ,
J. C. Bilello  and
S. M. Yalisove
J. F. Whitacre
Affiliation:
University of Michigan, Department of Materials Science and Engineering, 2300 Hayward Street, Ann Arbor MI 48109–2136
J. C. Bilello
Affiliation:
University of Michigan, Department of Materials Science and Engineering, 2300 Hayward Street, Ann Arbor MI 48109–2136
S. M. Yalisove
Affiliation:
University of Michigan, Department of Materials Science and Engineering, 2300 Hayward Street, Ann Arbor MI 48109–2136
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Abstract

To examine the dependence of in-plane texture development on substrate surface morphology, deposition was performed on an intentionally roughened surface. 2 μm thick sputter deposited Mo films were macroscopically roughened by ion bombardment. This process created aligned mounds on the surface which were ˜1 μm in length, ˜0.1 μm in width and ˜0.04 miimn height. To remove crystallographic orientation effects, this surface was coated with a thin layer of graphite. Using these roughened, coated surfaces as a new substrates, the role of well defined macroscopic roughness in subsequent thin film growth was probed. Mo films were deposited onto these prepared substrates which were placed on a rotating platen under a stationary ion sputter source. When the mounds are aligned with their elongated axes normal to the rotation direction, little to no in-plane texture is found. The same deposition on a flat surface, or on the roughened surface with the mounds oriented parallel to the platen rotation direction, gives films with a high degree of in-plane texture. Scanning electron microscopy, transmission electron microscopy, and transmission electron diffraction data will be presented to corroborate these findings.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 440: Symposia CA – Structure and Evolution of Surfaces , 1996 , 241
Copyright
Copyright © Materials Research Society 1997

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References

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