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Published online by Cambridge University Press: 31 January 2011
We design and fabricate metallic photonic crystals with sharp absorption peaks in the infrared regime. We have fabricated a metallic photonic crystal consisting of a triangular lattice of holes in a silicon layer conformally coated with gold at a lattice pitch of 3.8 microns. Conventional lithographic and deep reactive ion etching was used. The photonic crystal exhibits a deep reflection minimum and sharp thermal emission peak near the lattice spacing. Measurements agree well with rigorous scattering matrix simulations. This simple single-layer structure with a single patterned exposure has no emission sidebands and can be scaled to other lattice spacings.