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The Spray Deposition of Transition Metal Nitride thin Films Using Alcohol Based Precursor Solutions

Published online by Cambridge University Press:  10 February 2011

K. S. Weil  and
P. N. Kumta
K. S. Weil
Affiliation:
Department of Materials Science and Engineering, Carnegie Mellon University, Pittsburgh, PA 15213
P. N. Kumta
Affiliation:
Department of Materials Science and Engineering, Carnegie Mellon University, Pittsburgh, PA 15213
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Abstract

A new alcohol solution based approach has been developed for preparing transition metal nitride thin films and coatings. In this technique, the metal of interest is dissolved as a chloride in acetonitrile, then chelated with triethanolamine to form a highly viscous solution which settles out of the solvent phase. The acetonitrile is then evaporated off and the remaining thick liquid precursor is easily diluted with water or methanol, yielding a semi-viscous liquid which can be used directly to coat various substrates. When heat treated under the appropriate conditions in ammonia, the precursor coating transforms to yield the corresponding nitride. This approach is currently being considered for preparing nitride-based thin film electrical components and has been successfully used thus far to spray deposit TaN and NbN nitride films onto silicon substrates. Results of the preliminary study on these two nitride films are discussed in this paper.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 495: Symposium W – Chemical Aspects of Electronic Ceramics Processing , 1997 , 227
Copyright
Copyright © Materials Research Society 1998

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References

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