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Structural Analysis of A–15 Nb3Al Substrates Implanted With Heavy Doses of Boron ions

Published online by Cambridge University Press:  15 February 2011

Mireille Treuil Clapp
Mireille Treuil Clapp*
Affiliation:
Mechanical Engineering, University of Massachusetts, Amherst, MA USA
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Abstract

Very heavy doses of B ions, up to 22 At%, were implanted into Nb3Al substrates depleted of Al. Energies as high as 1 MeV were used. The surface composition was Nb3Al1−xBx where x varied from 0 to 1 over a distance of 20,000Å. Auger analysis was done to determine composition depth profiles. Structure was analyzed with a diffractometer using Cr radiation. The x-rays sampled primarily the implanted layer. Phase analysis was carried out as a function of incremental heat treatments up to 1000 C. The A–15 phase was always present although its composition was uncertain. The tetragonal Nb3B2 phase appeared after annealing at 95OC. Superconducting transition temperatures were measured at all stages; no increase in Tc above that of the substrate was observed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 7 , 1981 , 283
Copyright
Copyright © Materials Research Society 1982

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References

REFERENCES

1.Clapp, M.T. and Rose, R.M., J. Appl Phys. 51, 540 (1980).Google Scholar
2.Kessel, Quentin, Physics Department, Univ of Conn., Storrs, CT 06268.Google Scholar
3.Cordtz, Bernard, Varion Extrion, Gloucester, MA.Google Scholar