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Structural Control of Carbon Nickel Thin Films Without Substrate Heating

Published online by Cambridge University Press:  11 July 2012

David Bosworth ,
Nadia Stelmashenko  and
Zoe H. Barber
David Bosworth
Affiliation:
Department of Materials Science and Metallurgy, University of Cambridge, Pembroke Street, Cambridge, CB2 3QZ, UK
Nadia Stelmashenko
Affiliation:
Department of Materials Science and Metallurgy, University of Cambridge, Pembroke Street, Cambridge, CB2 3QZ, UK
Zoe H. Barber
Affiliation:
Department of Materials Science and Metallurgy, University of Cambridge, Pembroke Street, Cambridge, CB2 3QZ, UK
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Abstract

A variety of characterization techniques have been employed to study the growth and structure of nickel carbon thin films fabricated by ionized magnetron sputter deposition. A two target magnetron system is used along with an RF powered coil, to create a secondary plasma, with a DC bias applied at the substrate. By varying the bias it is possible to control the energy of the depositing species as well as a range of other plasma properties and therefore the resulting film microstructure. It has been observed that a change from the metastable hexagonal nickel carbide phase to the stable face centered cubic structure of nickel can be induced. This change in metal crystallinity was accompanied by a change in carbon ordering. The ability to control the film structure and morphology without the need for substrate heating opens up the possibility of depositing a range of structures onto polymers.

Keywords

thin filmsputteringnanostructure
Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1451: Symposium DD/EE – Nanocarbon Materials and Devices , 2012 , pp. 145 - 150
Copyright
Copyright © Materials Research Society 2012

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References

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