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Structural, Optical and Electrical Characterization of Thermally Evaporated TlBr Thin Films

Published online by Cambridge University Press:  31 January 2011

Natália Destefano
Affiliation:
naty_destefano@yahoo.com.br, University of São Paulo, Department of Physics and Mathematics, Ribeirão Preto, Sao Paulo, Brazil
Marcelo Mulato
Affiliation:
mmulato@ffclrp.usp.br, University of São Paulo, Department of Physics and Mathematics, Ribeirão Preto, Sao Paulo, Brazil
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Abstract

This paper presents the study related to the production of TlBr thin films. Films produced by thermal evaporation present better structural properties than those produced by spray pyrolysis. The main XRD peak of the evaporated films correspond to the (100) plane, whose structure is columnar as revealed by cross section SEM. The thickness decreases with increasing deposition height. Optical band gap of 3.0 eV and electrical resistivities about 109 Ωcm were obtained. EDS reveals a reduction in the amount of Br in the final films. One order of magnitude was obtained for the photo-to-dark current ratio when irradiation in the medical diagnosis X-ray mammography energy range was used.

Type
Research Article
Copyright
Copyright © Materials Research Society 2009

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