Hostname: page-component-cd9895bd7-7cvxr Total loading time: 0 Render date: 2025-01-04T06:12:23.039Z Has data issue: false hasContentIssue false
  • English
  • Français

Study of Different Phases in a-C:H:N Thin Films Deposited by Plasma- Enhanced Chemical Vapour Deposition: A comparision Between Theoretical and Experimental Data

Published online by Cambridge University Press:  21 March 2011

F. Antoniella ,
L. Valentini ,
A. Continenza ,
L. Lozzi  and
S. Santucci
F. Antoniella
Affiliation:
Materials Research Center, University of Perugia, Loc. Pentima Bassa, 05100 Terni -, Italy
L. Valentini
Affiliation:
Materials Research Center, University of Perugia, Loc. Pentima Bassa, 05100 Terni -, Italy
A. Continenza
Affiliation:
INFM and Dipartimento di Fisica, University of L'Aquila, Via Vetoio 10 Coppito, 67010 - L'Aquila -, Italy
L. Lozzi
Affiliation:
INFM and Dipartimento di Fisica, University of L'Aquila, Via Vetoio 10 Coppito, 67010 - L'Aquila -, Italy
S. Santucci
Affiliation:
INFM and Dipartimento di Fisica, University of L'Aquila, Via Vetoio 10 Coppito, 67010 - L'Aquila -, Italy
Get access

Abstract

The electronic structure of amorphous carbon nitride (a-C:H:N) thin films prepared by radiofrequency (rf) plasma decomposition of CH4/N2 mixture was determined by soft x-ray photoe1ectron spectroscopy by the mean of synchrotron radiation source. On increasing N2 fraction, the valence band shows profound changes. The new features are identified by a comparison of the experimental spectra with theoretically weighted density of the states of graphite and C3N4 structures.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 672: Symposium O – Mechanisms of Surface and Microstructure Evolution in Deposited Films and Film Structures , 2001 , O82.1
Copyright
Copyright © Materials Research Society 2001

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Grill, A., Diamond and Rel. Mater. 8, 428 (1999).Google Scholar
2. Frenlach, M. and Spear, K. E., J. Mater. Res. 3, 133 (1987).Google Scholar
3. Cutiongco, E. C., Li, D. and Bhatia, C. S., Trans. ASME, J. Tribol. 118, 543 (1996).Google Scholar
4. Khurshudov, A., Kato, K. and Daisuke, S., J. Vac. Sci. Technol. A14, 2935 (1996).Google Scholar
5. Liu, A. Y. and Cohen, M. L., Phys. Rev. B 55, 15 (1990)Google Scholar
6. Wimmer, E., Krakauer, H., Weinert, M. Freeman, A. J., Phys. Rev. B 24, 864 (1981) and references therein.Google Scholar
7. Yeh, J. J. and Lindau, I. Atomic subshell photoionization cross sections and asymmetry parameters Ed. Academic Press Inc.Google Scholar
8. Sjöstrom, H.et al., J. Vac. Sci. Technol. A14, 56 (1996)Google Scholar