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Sxes Study of Transition Metal Silicide Films and their Contacts to Semiconductors

Published online by Cambridge University Press:  21 February 2011

H. Watabe ,
M. Iwami ,
M. Hirai ,
M. Kusaka ,
M. Kubota ,
H. Nakamura ,
M. Kawai ,
H. Soezima  and
F. Akao
H. Watabe
Affiliation:
Matsushita Electric Industrial Co., Ltd., Twin 21 National Tower, 2–1–61 Shiromi, Chu-o-ku, Osaka 540, Japan
M. Iwami
Affiliation:
Research Laboratory for Surface Science, Faculty of Science, Okayama University, Okaya-ma 700, Japan
M. Hirai
Affiliation:
Research Laboratory for Surface Science, Faculty of Science, Okayama University, Okaya-ma 700, Japan
M. Kusaka
Affiliation:
Research Laboratory for Surface Science, Faculty of Science, Okayama University, Okaya-ma 700, Japan
M. Kubota
Affiliation:
Research Laboratory for Surface Science, Faculty of Science, Okayama University, Okaya-ma 700, Japan
H. Nakamura
Affiliation:
Osaka Electro-Communication University, Hatsu, Neyagawa, Osaka 572, Japan
M. Kawai
Affiliation:
Shimazu Corp., 1 Nishinokyo-Kawabaracho, Nakagyou-ku, Kyoto 604, Japan
H. Soezima
Affiliation:
Shimazu Corp., 1 Nishinokyo-Kawabaracho, Nakagyou-ku, Kyoto 604, Japan
F. Akao
Affiliation:
Okayama University of Science, Ridai-cho, Okayama 700, Japan
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Abstract

Spectra obtained by a new soft x-ray emission spectroscopy(SXES) apparatus again exhibited clear differences among Si-compounds and Si crystal. A non-destructive analysis of an annealed transition metal(TMSi:film)/Si(111) contact system was carried out using either the distinct differences of Si L2, 3 SXES spectra between TMSi's and Si single crystals or the fad that the soft x-ray production depth increases in a solid with the energy of the primary electron, Ep. It was shown that the apparatus was capable of exploring electronic and atomic structures of a multi-layered contact system grown on a Si(111) substrate.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 187: Symposium J – Thin Film Structures and Phase Stability , 1990 , 173
Copyright
Copyright © Materials Research Society 1990

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References

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