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Synthesis and Characterization of α-Alumina Films Via Combustion Chemical Vapor Deposition

Published online by Cambridge University Press:  10 February 2011

G. Grandinetti ,
S. Shanmugham ,
M.R. Hendrick  and
J.M. Hampikian
G. Grandinetti
Affiliation:
School of Materials Science, Georgia Institute of Technology, Atlanta, GA 30332-0245
S. Shanmugham
Affiliation:
MicroCoating Technologies, 3901 Green Industrial Way, Chamblee, GA 30341
M.R. Hendrick
Affiliation:
MicroCoating Technologies, 3901 Green Industrial Way, Chamblee, GA 30341
J.M. Hampikian
Affiliation:
School of Materials Science, Georgia Institute of Technology, Atlanta, GA 30332-0245
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Abstract

α-Alumina films are useful for high-temperature, wear, and semiconductor device applications because of their good oxidation resistance, high hardness values, and electrical properties. α-Alumina films have been previously synthesized using techniques such as chemical vapor deposition, sol-gel, physical vapor deposition, and plasma spraying. This paper presents an alternative approach for producing high quality dense α-alumina coatings using a flame-assisted process called combustion chemical vapor deposition (CCVD). This process is an open atmosphere technique that does not require the use of a reaction chamber. In this work alumina films were grown on YSZ at temperatures ranging from 900 to 1500°C. At lower temperatures only amorphous alumina was grown, but as the deposition temperature increased different alumina phases were formed. At 1100°C, a thin highly crystalline θ-Al2O3 coating was formed. At temperatures higher than 1100°C thick θ-Al2O3 coatings were deposited on the YSZ. Coatings were characterized by scanning electron microscopy (SEM) and x-ray diffraction (XRD).

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 616: Symposium I – New Methods, Mechanisms & Models of Vapor Deposition , 2000 , 241
Copyright
Copyright © Materials Research Society 2000

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References

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