Hostname: page-component-78c5997874-4rdpn Total loading time: 0 Render date: 2024-11-13T02:17:23.278Z Has data issue: false hasContentIssue false

Theoretical Study of Native Defect Coiplexes in GaAs

Published online by Cambridge University Press:  28 February 2011

P.J. Lin-Chng
Affiliation:
Naval Research Laboratory, Washington, D.C. 20375
Yuan Li
Affiliation:
Rutgers, The State University, Newark, N.J. 07102
Get access

Abstract

A theoretical study of native defect complexes in GaAs is reported here. These calculations are based on tight-binding Hamiltonians and employ a large cluster recursion method to obtain the changes of local densities of states. A new description of the tight-binding matrix elements developed by us is used to take into account the lattice relaxation and to provide the interaction matrix elements between the antisite defect and its neigiitors. We have examined the complexes GaAsVGa, (VGa)2, VGaAsGaVGa, VGaAsGaVGa, AsGaVAs and VAsAsGaVAs. The results indicate that the use of realistic interaction between the antisite atom and its neighloors is essential to obtain an accurate result for the midgap state of the isolated antisite and that the GaAsVGa,AsGaVAs, (VGa)2 may be responsible for the A,D hole traps and the electron trap C as proposed recently by Zou et al. using a thermochemical model. Both VGaAsGaVGa and VGaAsGaVAs are found to produce states in the gap. It is not possible to exclude either of them as a candidate for the EL2 state. A detailed analysis of the states induced by the defect complexes is made.

Type
Research Article
Copyright
Copyright © Materials Research Society 1985

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Lang, D. V. and Logan, R. A., Electron. later., 4, 1053 (1975); and J. Appl. Phys. 47, 1533 (1976).Google Scholar
2. Ozeki, H., Komeno, J., Shibatomi, A. and Ohkawa, S., J. Appl. Phys., 50, 4808 (1979).Google Scholar
3. Zou, Y., Zhou, J., Lu, Y., K. W[ang, Hu, B., Lu, B., Li, C., Li, L., Shao, J. and Sheng, C., Proc. 13th Conf. on the Defects in Semiconductors. Published by the Metallurgical society of ran, p.1021 (1984).Google Scholar
4.See, for example, the review by Weber, E.R., p.3 in thie samne Vol. as ref.3.Google Scholar
5. Vechten, J. A. Van, J. Electrochem. Soc., 122, 423 (1975).Google Scholar
6. Vechten, J. A. Van, J. Phys. C. (in press).Google Scholar
7. Haydock, R., Heine, V. and Kelly, I. J., J. Priys. C., 5, 2845 (1975).Google Scholar
8. Li, Y. and Lin-Chung, P. J., J. Phys. Chema. and Solids. (in press).Google Scholar
9. Lin-Chung, P. J., Defects in Semiconductors II, p.267, Elsevier Science Publishing Co., New York, 1983.Google Scholar
10. Lin-Chung, P. J. and Li, Y., Proc. 13th Conf. on the Defects in Semiconductors. p.1071 (1984).Google Scholar
11. Lin-Chung, P. J. and Reinecke, T. L., Phys.Rev. B27, 1101 (1983).Google Scholar
12. Bernholc, J. and Pantelides, S. T., Phys. Rev. B13, 1780 (1978)Google Scholar