Hostname: page-component-78c5997874-t5tsf Total loading time: 0 Render date: 2024-11-10T09:23:57.913Z Has data issue: false hasContentIssue false
  • English
  • Français

Thin Film Thermochromic Materials for Non-Linear Optical Devices.

Published online by Cambridge University Press:  15 February 2011

Keith L Lewis ,
A M Pitt ,
T Wyatt-Davies  and
J R Milward
Keith L Lewis
Affiliation:
Defence Research Agency St Andrews Road, Malvern Worcs WR14 3PS, UK
A M Pitt
Affiliation:
Defence Research Agency St Andrews Road, Malvern Worcs WR14 3PS, UK
T Wyatt-Davies
Affiliation:
Defence Research Agency St Andrews Road, Malvern Worcs WR14 3PS, UK
J R Milward
Affiliation:
Defence Research Agency St Andrews Road, Malvern Worcs WR14 3PS, UK
Get access

Abstract

A number of materials are available which exhibit thermochromic properties. These include the superionic materials (eg silver sulphide), phase transition materials (eg vanadium dioxide) and mixed valence materials (eg SmS). Such materials can be exploited as optical thin films and when incorporated into multilayer structures exhibit non-linear properties, particularly at wavelengths in the infra-red (1–12μm). The response of such devices is dependant on the degree of temperature rise produced in the active material, which in turn is dependant on the optical properties of the material and the heat sinking characteristics of the substrate. A summary is presented highlighting techniques for film deposition, multilayer device design and temporal response characteristics measured under conditions of pulsed irradiation.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 374: Symposia ZB – Materials for Optical Limiting , 1994 , 105
Copyright
Copyright © Materials Research Society 1995

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Craig, D, Miller, A and Soileau, M J: Optics Letters 11 794 (1986)Google Scholar
2. Jamisen, S A and Nurmikko, A V: Phys Rev B19 5185 (1979)Google Scholar
3. Pohl, D W and Holzberg, F: Appl Optics 14 1060 (1975)Google Scholar
4. Junod, P, Hediger, H, Kilcher, B and Wullschleger, J: Phil Mag 36 941 (1977)Google Scholar
5. Dalven, R and Gill, R: Phys Rev 159 645 (1967)Google Scholar
6. Macleod, H A, Case, W E and Purvis, M K: Proc OSA Topical Meeting on Optical Interference Coatings, Monterey, April 17–19 (1984)Google Scholar
7. Calverley, G J, Emmony, D C, Lewis, K L and Huckridge, D: Proc 1994 Boulder Laser Damage Symposium, to be published as SPIE Conference ProceedingsGoogle Scholar
8. Kirk, J L, Vedam, K, Narayanamurti, V, Jayaraman, E and Bucher, E: Phys Rev B6 3023 (1972)Google Scholar
9. Batlogg, B: Phys Rev B23 650 (1981)Google Scholar