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Titania Coated Silica Nanowires

Published online by Cambridge University Press:  31 January 2011

Avi Shalav ,
Dinesh Kumar Venkatachalam ,
Fabian Reichardt ,
Frederic J.C. Fischer  and
Robert G. Elliman
Avi Shalav
Affiliation:
avi.shalav@anu.edu.aua.shalav@gmail.com, The Australian National University, Department of Electronic Materials, Canberra, Australian Capital Territory, Australia
Dinesh Kumar Venkatachalam
Affiliation:
Dinesh.Venkatachalam@anu.edu.au
Fabian Reichardt
Affiliation:
jofab@gmx.de, n/a, Canberra, Australian Capital Territory, Australia
Frederic J.C. Fischer
Affiliation:
fischerfjc@googlemail.com, Universität Augsburg, Institut für Physik, Augsburg, Germany
Robert G. Elliman
Affiliation:
rob.elliman@anu.edu.au, The Australian National University, Department of Electronic Materials, Canberra, Australian Capital Territory, Australia
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Abstract

The morphology, phase and stability of titania-coated SiOX NWs are investigated for two coating methods: solution-based deposition of Ti-alkoxides and Atomic Layer Deposition (ALD). Analysis of as-deposited and annealed films shows that it is possible to produce stable coatings of the anatase phase of TiO2. The limitations of these two approaches are also discussed.

Keywords

coatingnanostructureatomic layer deposition
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1206: Symposium M – Multifunction at the Nanoscale through Nanowires , 2009 , 1206-M16-05
Copyright
Copyright © Materials Research Society 2010

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