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Tunable Uv Laser Photolysis of Organometallic Compounds with Product Detection by Laser Mass Spectroscopy

Published online by Cambridge University Press:  25 February 2011

Th. Beuermann  and
M. Stuke
Th. Beuermann
Affiliation:
Max-Planck-Institut für biophysikalische Chemie, P.O.2841, D−3400 Göttingen, F. R. Germany
M. Stuke
Affiliation:
Max-Planck-Institut für biophysikalische Chemie, P.O.2841, D−3400 Göttingen, F. R. Germany
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Abstract

We use tunable UV laser light in the region 200-320 nm, produced by frequency doubling the output of a dye laser for the decomposition of organometallic compounds. This method has been applied to TMA, trimethylaluminum AI(CH3)3. Only theTMA monomer absorbs UV light for λ>220nm. TMA decomposes by one-photon absorption mainly into two channels: aluminum plus organic fragments and aluminummonomethyl plus organic fragments. The ratio [A1]/[AICH3] is wavelength dependent. Finally, we present a mechanism to explain the photolysis of trimethyl compounds of group III elements (Al,Ga,In).

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 129: Symposium B – Laser and Particle-Beam Modification of Chemical Processes on Surfaces , 1988 , 79
Copyright
Copyright © Materials Research Society 1989

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References

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