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X-Ray Fluorescence Determination of Low Metal Concentration in Surface Masking Layers on Organic Polymers

Published online by Cambridge University Press:  25 February 2011

Richard S. Hutton  and
Gary N. Taylor
Richard S. Hutton
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ 07974
Gary N. Taylor
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ 07974
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Abstract

A highly sensitive x-ray fluorescence (XRF) technique has been developed for the determination of low metal concentrations in the etch resistant layer of surface-imaged photoresists. The samples may be analyzed quickly and the method is applicable to a wide variety of surfaceimaging processes. For each metal of interest the XRF spectrometer is easily calibrated using polymer films containing known concentrations of a metal-containing reagent. Examples of the application of this technique to the analysis of Ti, Si and Zr-containing films are described.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 236: Symposium B – Photons and Low Energy Particles in Surface Processing , 1991 , 265
Copyright
Copyright © Materials Research Society 1992

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References

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