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D056 Investigation of strain, relaxation degree, interface roughness and porosity of SiGe/Si modfet heterostructures — invited

Published online by Cambridge University Press:  20 May 2016

A. Ulyanenkov
Affiliation:
Bruker AXS GmbH, Karlsruhe, Germany
M. Myronov
Affiliation:
Musashi Institute of Technology, Tokyo, Japan
Y. Shiraki
Affiliation:
Musashi Institute of Technology, Tokyo, Japan
K. Saito
Affiliation:
Bruker AXS K.K., Kanagawa, Japan

Abstract

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Type
Denver X-Ray Conference
Copyright
Copyright © Cambridge University Press 2006

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