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X-ray diffraction analysis of ultrathin platinum silicide films deposited on (100) silicon

Published online by Cambridge University Press:  05 March 2012

T. N. Blanton  and
C. R. Hoople
T. N. Blanton*
Affiliation:
Eastman Kodak Company, Research Laboratories, Rochester, New York 14650-2106
C. R. Hoople
Affiliation:
Eastman Kodak Company, Research Laboratories, Rochester, New York 14650-2106
*
a)Electronic mail: thomas.blanton@kodak.com
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Abstract

X-ray diffraction methods have been used successfully for the analysis of platinum silicide films of 100 Å or less in thickness. Conventional X-ray diffraction was utilized for phase identification, planar orientation, and crystalline size determination. Low-angle X-ray specular reflectivity analysis measured film thickness. As the nominal film thickness approached 100 Å, it was observed that the deposited platinum film thickness was larger than expected and longer anneal times would be required to ensure homogeneous platinum silicide phase composition.

Keywords

platinum silicidePtSireflectivitythin filmX-ray diffraction
Type
Technical Articles
Information
Powder Diffraction , Volume 17 , Issue 1 , March 2002 , pp. 7 - 9
Copyright
Copyright © Cambridge University Press 2002

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