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D-101 From Lab to Fab: The Development and Deployment of New Metrology Technology for the Global Semiconductor Industry—Invited

Published online by Cambridge University Press:  20 May 2016

B. Landes ,
B. Kern ,
J. Niu ,
C. Mohler ,
J. Hahnfeld ,
D. Yontz ,
K. Ender ,
C. Silvis ,
R. Strittmatter  and
L. Moore
...Show all authors
B. Landes
Affiliation:
Dow Chemical Co., Midland, MI
B. Kern
Affiliation:
Dow Chemical Co., Midland, MI
J. Niu
Affiliation:
Dow Chemical Co., Midland, MI
C. Mohler
Affiliation:
Dow Chemical Co., Midland, MI
J. Hahnfeld
Affiliation:
Dow Chemical Co., Midland, MI
D. Yontz
Affiliation:
Dow Chemical Co., Midland, MI
K. Ender
Affiliation:
Dow Chemical Co., Midland, MI
C. Silvis
Affiliation:
Dow Chemical Co., Midland, MI
R. Strittmatter
Affiliation:
Dow Chemical Co., Midland, MI
L. Moore
Affiliation:
Dow Chemical Co., Midland, MI
T. Stokich
Affiliation:
Dow Chemical Co., Midland, MI
D. King
Affiliation:
Dow Chemical Co., Midland, MI
J. Quintana
Affiliation:
Northwestern University, Chicago, IL
S. Weigand
Affiliation:
Northwestern University, Chicago, IL
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Abstract

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Type
Denver X-Ray Conference
Information
Powder Diffraction , Volume 19 , Issue 2 , June 2004 , pp. 195
Copyright
Copyright © Cambridge University Press 2004

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