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F34 Applications of X-ray reflectivity to develop and monitor feol and beol processes for sub-65nm technology nodes

Published online by Cambridge University Press:  20 May 2016

E. Nolot
Affiliation:
CEA-DRT—LETI—CEA/GRE, Grenoble, France

Abstract

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Type
Denver X-Ray Conference
Copyright
Copyright © Cambridge University Press 2006

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