We have constructed an X-ray photoelectron microscopic system.
An X-ray source is a laser-produced plasma in a scheme of an
X-ray laser experiment. X rays involving amplified spontaneous
emissions (ASE) at 15.47 nm were delivered with a 10-Hz repetition
rate from a compact X-ray laser system. X rays were collected
and focused by a Schwarzschild optics coated with Mo/Si multilayers
for a 15.47-nm X ray. Photoelectron signals due to the Ga
3d and As 3d electrons were observed, when
a GaAs wafer was used as a sample. The spatial resolution of
about 1 μm was confirmed.