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Depth Profiling by Means of X-Ray Photoelectron Spectrometry

Published online by Cambridge University Press:  06 March 2019

M.F. Ebel ,
H. Ebel  and
F. Olcaytug
M.F. Ebel
Affiliation:
Institut für Angewandte und Technische Physik Technische Universität Wien, A 1040 Wien (Austria)
H. Ebel
Affiliation:
Institut für Angewandte und Technische Physik Technische Universität Wien, A 1040 Wien (Austria)
F. Olcaytug
Affiliation:
Institut für Allgemeine Elektrotechnik und Elektronik Technische Universität Wien, A 1040 Wien (Austria)
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Extract

The depth range d of x-ray photoelectron spectrometry (XPS) is determined by the inelastic mean free path λ of photoelectrons . The following considerations are dedicated to a correlation between d and λ.

Type
XI. Thin-Film and Surface Characterization by XRS and XPS
Information
Advances in X-Ray Analysis , Volume 35 , Issue B: First Pacific-International Congress on X-ray Analytical Methods (PICXAM). Fortieth Annual Conference on Applications of X-ray Analysis, August 7-16, 1991 , 1991 , pp. 857 - 867
Copyright
Copyright © International Centre for Diffraction Data 1991

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References

1. Hanke, W., Ebel, H., Ebel, M. F., Jablonski, A. and Hirokawa, K., J. Electron Spectrosc. Related Phenom. 40, 241 (1986)10.1016/0368-2048(86)80023-8Google Scholar
2. Penn, D. R., J.Electron Spectrosc.Relat.Phenom. 9, 29 (1976)10.1016/0368-2048(76)85004-9Google Scholar
3. Ishizaka, A., Iwata, S. and Kamigaki, Y., Surf,Sci. 84, 355 (1979)10.1016/0039-6028(79)90142-0Google Scholar
4. Fadley, C. S., in G. A.Somorjai and McCaldin, J. G. (eds.), Progr.Solid State Chem., 11, 265 (1976)10.1016/0079-6786(76)90013-3Google Scholar
5. Ebel, M. F., J.Electron Spectrosc.Relat.Phenom. 14, 287 (1978)10.1016/0368-2048(78)80005-XGoogle Scholar
6. Ebel, H., Ebel, M. F., Wernisch, J. and Jablonski, A., Surf. Interface Anal. 6, 140 (1984)10.1002/sia.740060307Google Scholar
7. Baschenko, O. A. and Hefedov, V. I., J. Electron Spectrosc. Relat. Phenom. 17, 405 (1979)10.1016/0368-2048(79)80002-XGoogle Scholar
8. Ebel, M. F., Moser, G., Ebel, H., Jablonski, A. and Oppolzer, H., J. Electron Spectrosc.Related Phenom. 42, 61 (1987)10.1016/0368-2048(87)85006-5Google Scholar
9. Kefedov, V. I., Lunin, V. V. and Chulkov, N. G., Surf.Interface Anal. 2, 179 (1980)Google Scholar
10. Tyler, B. J., Castner, D. G. and Ratner, B. D., Surf. Interface Anal. 14, 443 (1989)10.1002/sia.740140804Google Scholar
11. Tyler, B. J., Castner, D. G. and Ratner, B. D., J.Vac.Eci.Technol. A7, 1646 (1989)10.1116/1.576065Google Scholar
12. Baschenko, O. A. and NefGdov, V. I., J. Electron Spectrosc. Relat. Phenom. 53, 1 (1990)10.1016/0368-2048(90)80337-AGoogle Scholar
13. Ebel, H., Ebel, M. F., Svagera, R., Winklmayr, E. and Varga, P., J. Electron Spectrosc. Relat. phenom. (in press)Google Scholar
14. Vonbank, M. and Varga, P., Vakuum Technik 37, 220 (1988)Google Scholar