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Published online by Cambridge University Press: 06 March 2019
Reflection and fluorescence intensity profile curves for thin films were measured under the grazing incidence conditions using synchrotron radiation. A titanium layer and a carbon / titanium bilayer sputtered on a silicon wafer were subjected to heat treatment. The analysis of the reflection and fluorescence profile curves shows that the sample without the heat treatment has another high-density layer on the surface or interface, and that the heat treatment results in the removal of the high-density layer and the formation of a thick homogeneous layer.