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Instrumentation for Total Reflection Fluorescent X-Ray Spectrometry

Published online by Cambridge University Press:  06 March 2019

Tadashi Utaka  and
Tomoya Arai
Tadashi Utaka
Affiliation:
Rigaku Industrial Corporation Takatsuki, Osaka, Japan
Tomoya Arai
Affiliation:
Rigaku Industrial Corporation Takatsuki, Osaka, Japan
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Abstract

This article describes the instrumentation for a total reflection fluorescent x-ray spectrometer. The reflecting intensity and the angular divergence were studied with respect to various kinds of monochromators. Using silicon wafers, the angular divergence effect of the incident beam, surface roughness influences and the smoothing of background x-ray intensity for the improvement of the lower limit of detection were investigated.

Type
XII. Total Reflection XRS
Information
Advances in X-Ray Analysis , Volume 35 , Issue B: First Pacific-International Congress on X-ray Analytical Methods (PICXAM). Fortieth Annual Conference on Applications of X-ray Analysis, August 7-16, 1991 , 1991 , pp. 933 - 940
Copyright
Copyright © International Centre for Diffraction Data 1991

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References

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