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Multiple Scattering Contributions of Thin Films in Reflection Geometry

Published online by Cambridge University Press:  06 March 2019

J.E. Fernández  and
R. Sartori
J.E. Fernández
Affiliation:
Laboratorio di Ingegneria Nucleare di Montecuccolino University of Bologna Via dei Colli 16, 40136 Bologna, ITALY
R. Sartori
Affiliation:
Laboratorio di Ingegneria Nucleare di Montecuccolino University of Bologna Via dei Colli 16, 40136 Bologna, ITALY
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Abstract

The multiple scattering contributions to the emitted intensity of a thin homogeneous sample under X-Ray excitation are studied with recourse to the Boltzmann transport theory. The corrective terms to the XRF characteristic line due to a second collision of either the photoelectric effect (secondary XRF), or the Compton, or the Rayleigh scattering, are deduced for reflection geometry. Analytical expressions for the intensities are given that allow their computation for variable incidence and take-off beam directions and source wavelength.

Type
XI. Thin-Film and Surface Characterization by XRS and XPS
Information
Advances in X-Ray Analysis , Volume 35 , Issue B: First Pacific-International Congress on X-ray Analytical Methods (PICXAM). Fortieth Annual Conference on Applications of X-ray Analysis, August 7-16, 1991 , 1991 , pp. 835 - 843
Copyright
Copyright © International Centre for Diffraction Data 1991

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References

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