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Enhancement in redox and electrocatalytic activity observed on Si ion-implanted Ni

Published online by Cambridge University Press:  03 March 2011

M.T. Pham ,
M.F. Maitz ,
E. Richter ,
H. Reuther ,
A. Muecklich  and
F. Prokert
M.T. Pham
Affiliation:
Forschungszentrum Rossendorf e.V., Institute of Ion Beam Physics and Materials Research, 01314 Dresden, Germany
M.F. Maitz
Affiliation:
Forschungszentrum Rossendorf e.V., Institute of Ion Beam Physics and Materials Research, 01314 Dresden, Germany
E. Richter
Affiliation:
Forschungszentrum Rossendorf e.V., Institute of Ion Beam Physics and Materials Research, 01314 Dresden, Germany
H. Reuther
Affiliation:
Forschungszentrum Rossendorf e.V., Institute of Ion Beam Physics and Materials Research, 01314 Dresden, Germany
A. Muecklich
Affiliation:
Forschungszentrum Rossendorf e.V., Institute of Ion Beam Physics and Materials Research, 01314 Dresden, Germany
F. Prokert
Affiliation:
Forschungszentrum Rossendorf e.V., Institute of Ion Beam Physics and Materials Research, 01314 Dresden, Germany
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Abstract

Ni was surface-alloyed with Si by ion implantation. The material was examined for its redox and electrocatalytic behavior in NaOH by cyclic voltammetry. The surface was characterized by x-ray photoelectron spectroscopy, x-ray and electron diffraction, and electron and atomic force microscopy. The ion implantation enhanced activity toward the redox conversion of Ni(OH)2 ↔ NiOOH and the anodic oxidation of glucose reached about 3.5 times and about 2.8 times, respectively. The material is an amorphous mixed oxide of Ni and Si. The effect is discussed considering the true surface area and the generation of active surface sites in relation to the oxygen evolution.

Keywords

Si–Ni alloyElectrocatalysisIon implantation
Type
Articles
Information
Journal of Materials Research , Volume 19 , Issue 2 , February 2004 , pp. 616 - 622
Copyright
Copyright © Materials Research Society 2004

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