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Published online by Cambridge University Press: 21 February 2011
Phase formation of NiAl3 and Ni2Al3 were studied individually in lateral diffusion couples A and B and simultaneously in sample C. The lateral growth of certain phases was controlled by varying the thickness ratios of Al to Ni at the source and thin film area. Parabolic dependence of the phase width on annealing time was found for NiAl3 and Ni2Al3 in the one-phase and two-phase growth at 425 °C.