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Microstructure Development in Thin Films During Deposition from the Vapor Phase

Published online by Cambridge University Press:  21 February 2011

D. Goyal ,
A. H. King  and
J. C. Bilello
D. Goyal
Affiliation:
Department of Materials Science and Engineering, State University of New York, Stony Brook NY 11794-2275.
A. H. King
Affiliation:
Department of Materials Science and Engineering, State University of New York, Stony Brook NY 11794-2275.
J. C. Bilello
Affiliation:
School of Engineering and Computer Science, California State University, Fullerton CA 92634.
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Abstract

Transmission electron microscope observations of the structures of single-phase metallic thin films have been made. Films prepared by sputtering and by thermal evaporation have been used and the structures have been evaluated quantitatively as a function of film thickness. It is found that the grain size in all films increases linearly with the film thickness, indicating that grain growth occurs during film deposition.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 108 , 1987 , 395
Copyright
Copyright © Materials Research Society 1988

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References

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