Monolithic image sensors based on Thin Film on CMOS (TFC) Technology are becoming more and more attractive as an alternative solution to conventional active pixel sensors (APS). Imager with high sensitivity, high dynamic coupled with low dark current values (10-100 pA/cm2 @ 104 V/cm) have been developed. However, issues such as light-induced degradation and image lag hinder the commercial development of a-Si:H based image sensors. The problem of image lag is caused by residual current due to the release of trapped charges after the switch off of the illumination.

In this paper, we present a comprehensive study of the transient behavior of the photocurrent in a-Si:H photodiodes deposited on glass, as well as in corresponding diodes implemented in a TFC image sensor when illumination is switched off or periodically varied. The influence of the pixel architecture for two different cases is also analyzed: One setup reproduces the typical 3 transisor APS pixel architecture behavior, in which the bias voltage of the diode varies with the photogenerated charge while the second setup keeps a constant bias voltage applied to the diode by using a charge integrator.

The influence of the light-induced defect creation on the performance of the sensors is also presented and discussed.

Silicon nanowires with high aspect ratios have been grown at high density using a variation of Plasma Enhanced Chemical Deposition (PECVD) known as Pulsed PECVD (PPECVD). Growth rate and morphology were investigated for a range of catalysts: gold, silver, aluminum, copper, indium and tin. The thickness of the catalyst layer was 100nm. Deposition was carried out in a parallel plate PECVD chamber at substrate temperatures up to 350°C, from undiluted semiconductor grade Silane. A 1 kHz square wave was used to modulate the 13.56 MHz RF power. Samples were analyzed using either a Phillips XL20 SEM or a ZEISS 1555 VP FESEM. The average diameter for nanowires grown using a gold catalyst layer was 150nm and the average length was 4μm although some nanowires were observed with lengths up to 20μm. Back-scattered-electron images clearly show gold present at the tips of the silicon nanowires grown using gold as a catalyst, confirming their growth by the vapor liquid solid (VLS) mechanism. Sporadic growth of nanowires was detected when using copper as a catalyst. Although gold performed best as catalyst for nanowire growth it was, however, closely followed by tin. The other catalysts produced nanowires with properties between these extremes.

We studied the effect of prolonged mechanical strain on the electrical characteristics of thin-film transistors of hydrogenated amorphous silicon made at a process temperature of 150°C on 51-μm thick Kapton polyimide foil substrates. Effects are observed only at very high compressive strain of 1.8%. Tensile strain up to fracture at 0.3% to 0.5% does not show any effect, nor does compressive strain substantially less than 1.8%. The TFTs were stressed for times up to 23 days by bending around a tube with axis perpendicular to the channel length, and were evaluated in the flattened state. The changes observed are small. The threshold voltage is increased, the “on” current and the field effect mobility remain essentially constant, and the subthreshold slope, “off” current and gate leakage current drop somewhat. Overall, the observed changes are small. We conclude that mechanical strain caused by roll-to-roll processing and permanent shaping will have negligible effects on TFT performance.

Today amorphous and microcrystalline silicon based solar cells use surface-textured substrates for enhancing the light absorption and buffer and graded layers in order to improve the overall performance of the cells. Tandem and triple-junction configurations are utilized to assure better use of the solar spectrum and, thus, achieve higher conversion efficiencies of the devices. Resulting structures of the solar cells are complex and computer modeling has become an essential tool for a detailed understanding and further optimization of their optical and electrical behavior.

The performance limits of tandem and triple-junction silicon based solar cells are studied by simulations using the optical simulator SunShine developed at Ljubljana University and the opto-electrical simulator ASA developed at Delft University of Technology. First, both simulators were calibrated with realistic optical and electrical parameters. Then, they were used to study the required scattering properties, absorption in non-active layers, antireflective coatings, the crucial role of the wavelength selective intermediate reflector, and a careful current matching in order to indicate the way for achieving a high photocurrent, more than 15 mA/cm2 for a tandem a-Si:H/ìc-Si:H and 11 mA/cm2 for a triple-junction a-Si:H/a-SiGe:H/ìc-Si:H solar cells. By optimizing electrical properties of the layers and interfaces, for example using a p-doped a-SiC layer with a larger band gap (EG > 2 eV) and introducing buffer layers at p/i interfaces, the extraction of the charge carriers, the open-circuit voltage and the fill factor of the solar cells are improved. The potential for achieving the conversion efficiency over 15% for the a-Si:H/ìc-Si:H and 17 % for the triple-junction a-Si:H/a-SiGe:H/ìc-Si:H solar cells is demonstrated.

Microresonators based on thin film hydrogenated amorphous silicon microbridges were fabricated by surface micromachining on flexible polyethylene terephthalate (PET) substrates with a maximum processing temperature of 110°C. An aluminum sacrificial layer is used which is patterned by either wet etching or lift-off. Resonance in the MHz range was observed using electrostatic actuation. Processing of the microbridges on PET with sacrificial layer patterned by lift-off has higher yield than by etching. Bending measurements show that the thin film silicon microbridges on PET can withstand a higher compressive strain (-2.5%) than tensile strain (1.25%).

Silicon oxide films with excess of Si were deposited by Low Pressure Chemical Vapor Deposition. The growth rate of the films and the excess of silicon in them have been modeled using a Face-centered Central Composite Design experiment. Samples annealed at 1100°C show luminescence (665 nm) at 80K and at room temperature associated to Si nanocrystals.

We report our recent progress on high rate deposition of hydrogenated amorphous silicon (a-Si:H) and silicon germanium (a-SiGe:H) based n-i-p solar cells. The intrinsic a-Si:H and a-SiGe:H layers were deposited using modified very high frequency (MVHF) glow discharge. We found that both the initial cell performance and stability of the MVHF a-Si:H single-junction cells are independent of the deposition rate up to 15 Å/s. The average initial and stable active-area cell efficiencies of 10.0% and 8.5%, respectively, were obtained for the cells on textured Ag/ZnO coated stainless steel substrates. a-SiGe:H single-junction cells were also optimized at a rate of ~10 Å/s. The cell performance is similar to those made using conventional radio frequency technique at 3 Å/s. By combining the optimized component cells made at 10 Å/s, an a-Si:H/a-SiGe:H double-junction solar cell with an initial active-area efficiency of 11.7% was achieved.

Recent efforts to advance photoluminescence (PL)-based oxygen sensors have focused on developing compact, field-deployable devices. This has led to organic light emitting device (OLED)-based sensors with a structurally integrated [OLED excitation source]/[sensing film] module. To additionally integrate a photodetector (PD), PECVD for fabrication of thin-film p-i-n and n-i-p Si- and Si,Ge-based PDs was employed. O2 concentrations are advantageously determined by monitoring the effect of O2 on shortening the PL decay time  of an oxygen-sensitive dye, rather than on quenching its PL intensity. This approach, which employs pulsed OLEDs, eliminates the need for frequent sensor calibration, minimizes issues associated with background light, and eliminates the need for optical filters, which lead to bulkier sensors. However, it requires PDs with response times significantly shorter than . Therefore, the development of thin-film PDs focused on decreasing their response time, and understanding the factors affecting it. In this paper we show that boron diffusion during growth from the p+ to the i layer increases the response time of PECVD grown p-i-n PDs. Incorporating a SiC buffer layer and fabricating superstrate structures, where the p+ layer is grown last, decrease it. Additionally, ECR fabricated PDs show a slower response in comparison to VHF PECVD-grown PDs.

In this paper an overview of our developments towards industrialization of thin film silicon PV modules is presented. Amorphous silicon p-i-n solar cells have been developed in medium size single-chamber R&D KAI-M PECVD reactors. High initial efficiencies of 10.6 % and stabilized of 8.6 % could be achieved for a 1 cm2 a-Si:H p-i-n solar cell of 0.20 m thick i-layer deposited on TCO from Asahi U type (SnO2). On our in-house developed LPCVD ZnO we could further improve the stabilized a-Si:H p-i-n efficiency to a similar level of 8.5 %. Incorporating such cells in commercial available front TCO of lower quality still leads to high initial mini-module aperture efficiencies (10 × 10 cm2) of 9.1% and stabilized ones of 7.46% (independently measured by ESTI JRC-Ispra).

Transferring the processes from the KAI-M to the industrial size 1.1×1.25 m2 KAI-1200 R&D reactors resulted in a-Si:H modules of 110.6 W using commercial TCO, respectively 112.4 W when applying in-house developed LPCVD front ZnO. Both initial module performances have been independently measured by ESTI laboratories of JRC Ispra. A typical temperature coefficient for the module power of -0.22 %/°C (relative loss) has been deduced from temperature dependent I-V characteristics at ESTI laboratories of JRC Ispra. Finally, micromorph mini-modules of 10 % initial aperture efficiency have been fabricated.

Microcrystalline silicon oxide (μc-SiO) deposited from the gas mixture of silane and carbondioxide using VHF plasma was reported by authors to be the promising material for thin-film silicon solar cell fabricated on glass substrate, comparing with the conventional amorphous silicon oxide or microcrystalline silicon p-layer. High-performance, tandem-type solar cell with amorphous and microcrystalline cells (double cells) has been achieved by ap-plying this μc-SiO to the p-layer of both cells.

Further work has been extended to a-Si tandem type solar cell with triple cell configu-ration using amorphous silicon oxide (a-SiO), amorphous silicon germanium (a-SiGe) and microcrystalline Si (μc-Si) as the top, middle and bottom cells, respectively. Up to now, cell efficiency of 15.7 % has been achieved using this novel μc-SiO.

In the research field of crystalline silicon (c-Si) solar cells, electronic surface passivation has been recognized as a crucial step to achieve high conversion efficiencies. The main issue of this article is to analyze the surface passivation properties of both, n-type and p-type crystalline silicon wafers by hydrogenated amorphous silicon sub oxide [a-SiOx:H] films the for use in hetero-junction (a-Si/c-Si) solar cells. A window layer is obtained with a certain fraction of oxygen in the a-SiOx:H layers.

The a-SiOx:H films were deposited by decomposition of silane, carbon dioxide and hydrogen as source gases using plasma enhanced chemical vapor deposition (PECVD). Films with varying deposition parameters such as gas flow ratio (oxygen fraction) and plasma frequency (13.56, 70.0 and 110.0 MHz) are compared.

To determine the passivation quality of the a-SiOx:H films, microwave-detected photo conductance decay (µ-PCD) provides a contactless measurement of the effective recombination lifetime of free carriers. The film compositions and also the changes in the microscopic structure of the amorphous network upon thermal annealing are studied using Raman spectroscopy and optical profiling techniques.

The Raman spectra reveal the generation of Si-(OH)x and Si-O-Si bonds after thermal annealing in the layers, leading to a higher effective lifetime, as it reduces the defect absorption of the sub oxides.

For n-type FZ material, lifetime values as high as 1650 µs are obtained, resulting in a surface recombination velocity Seff < 9.5 cm/s.

We report the fabrication of an amorphous silicon based fluorescence sensor for miniaturized total analysis systems along with experimental results on optical excitation and detection elements. The pin-photodiode exhibits a dynamic range of 110dB and a room temperature dark current of less than 3000 charge carriers per ms according to a detector area of 0.1256mm2. The spectral response is ranging from 320nm to 780nm with a maximum at 600nm @ 80% quantum efficiency. To provide high sensitivity, the excitation light irradiates the fluid orthogonally to the active sensor detection direction by means of specifically designed microfluidic capillaries filled with e.g. methylene iodide or 1,2-o-dibrombenzene. The liquid core, which is enclosed by solid cladding materials, has been calculated to dimensions of a width of 16.75µm or 59.67µm with a height from 15µm to 50µm according to a number of propagating modes inside of 16 or 57, respectively.

Nanocrystalline Si:H is an important material for solar cells. The electronic properties of the material depend critically upon the degree of crystallinity, the efficacy of passivation of the grain boundaries and impurities, particularly oxygen, in the material. In this paper, we examine different degrees of passivation of grain boundaries by amorphous Si, by deliberately introducing various thicknesses of amorphous tissue layers at the grain boundaries. The device structure consisted of a p+nn+ cell on stainless steel where the base n layer was fabricated using alternating layers of amorphous (a-Si) and crystalline (nc-Si) phases, creating a superlattice structure. The thicknesses of the amorphous and crystalline phases were varied to study their influence on structural and electrical properties such as grain size and diffusion length. We find that <111> grain continued to be nucleate independently of the thickness of the amorphous layer, but the grain size in <220> grain decreased when the thickness of the tissue layer became very large. We also find that as the thickness of the amorphous tissue layer increased, the quantum efficiency at 800 nm decreased and the open circuit voltage increased. For significant thickness of amorphous layer, the transport properties degrade dramatically, causing an inflection in the I-V curve, probably because of difficulty of holes tunneling across the barriers.

Solid-phase crystallization (SPC) rates are compared in amorphous silicon films prepared by three different methods: hot-wire chemical vapor deposition (HWCVD), plasma-enhanced chemical vapor deposition (PECVD), and electron-beam physical vapor deposition (e-beam). Random SPC proceeds approximately 5 and 13 times slower in PECVD and e-beam films, respectively, as compared to HWCVD films. Doping accelerates random SPC in e-beam films but has little effect on the SPC rate of HWCVD films. In contrast, the crystalline growth front in solid-phase epitaxy experiments propagates at similar speed in HWCVD, PECVD, and e-beam amorphous Si films. This strongly suggests that the observed large differences in random SPC rates originate from different nucleation rates in these materials while the grain growth rates are relatively similar. The larger grain sizes observed for films that exhibit slower random SPC support this suggestion.

We report on the measurement of local current flow in hydrogenated amorphous and nanocrystalline mixed-phase n-i-p silicon solar cells in the initial, light-soaked, and annealed states using conductive atomic force microscopy (C-AFM). The C-AFM measurement shows that the nanometer-size grains aggregate, and the local current densities in the nanocrystalline aggregation areas decreased significantly after light soaking and recovered to values similar to the initial state after annealing at a high temperature in a vacuum. This result supports the model of two parallel-connected diodes for explaining the light-induced open-circuit voltage increase in the mixed-phase solar cells.

We present a material study on RF PECVD-grown a-Ge:H showing that thin films of such material can be produced without using the conventional techniques of high power density or powered-electrode substrate placement. We demonstrate the production of material with PDS signatures superior to material produced at ten times higher power density. This is achieved through the use of Ar and H2 dilution and by growing the films at high pressures under conditions where nanocrystals formed in the gas phase contribute significantly to the growth as confirmed by HRTEM. The conditions described result in material which demonstrates activated conduction down to room temperature. Additionally, the quality of the material has been demonstrated through its application in n-i-p diodes. A spectral response at 0.9um of 0.38 and an AM1.5 efficiency of 2.1% have been demonstrated utilizing an absorber layer thickness of only 60nm.

Solid-phase crystallization and the subsequent re-hydrogenation of the amorphous silicon thin films provides a low cost approach for thin-film crystalline Si:H-based photovoltaic devices. During the hydrogen effusion, significant lattice reconstruction occurs, as hydrogen is driven out of the film, accompanied by creation and migration of a large number of dangling bonds. We used electron-spin-resonance (ESR) to study evolution of the local order surrounding these dangling bonds during crystallization. When samples made by both plasma enhanced chemical vapor deposition (PECVD) and the and hot wire CVD (HWCVD) are heated to 560°C, hydrogen effuses within 30 min, giving rise to H-effused defect densities of about 5x1018 cm-3. Further heating at 560°C results in crystallizati°n in the HWCVD sample after about 200 min. On the other hand, PECVD samples crystallize only when heated up to 580°C, and then only after much longer times (Dt ~ 1300 min) [1,2]. ESR defects in both samples persist at the 5x1018 cm-3 level as long as the sample remains amorphous during the grain nucleation period. As the crystallites appear, the defect densities gradually decrease and saturate at about 3x1017 cm-3 as the crystallization is completed, both in HWCVD and PECVD samples.

In the H-effused states before crystallization, the ESR signals for both the HWCVD and PECVD samples show significant exchange-narrowing, suggesting that the defects are probably clustered. As the sample crystallizes, the defect clustering largely disappears, yet the line-widths in fully crystallized films are somewhat narrower than those in typical micro-crystalline silicon thin films as reported earlier [3]. This difference is probably due the specific structures of the grain boundaries in the present study. The effect of re-hydrogenation on both the H-effused amorphous and crystallized states will be discussed.

Interdigitated back contact silicon heterojunction (IBC-SHJ) solar cells have been developed. This structure has interdigitated p/n amorphous silicon (a-Si:H) films deposited by plasma enhanced chemical vapor deposition (PECVD) on the backside of crystalline silicon (c-Si) wafers, with light irradiating the front surface. IBC-SHJ cells possess advantages over front junction a-Si:H/c-Si heterojunction cells due to minimized current losses in the illuminating side, and over traditional diffused back-junction cells due to low temperature processing combined with the potential of high voltages for the heterojunction. Current-voltage curves, spectral response and laser beam induced current maps have been used to characterize the IBC-SHJ cells. It was found that the IBC-SHJ cell has non-linear illumination level dependence that correlates with effective minority-carrier lifetime. As the performance of these cells is very sensitive to the quality of passivation on front surface, they are ideally suited as a diagnostic tool for detail characterization of surface passivation. Initial cell structures have achieved independently confirmed cell efficiencies of 11.8% under AM1.5 illumination. Device simulation shows an efficiency of higher than 20% can be expected after optimizing the IBC-SHJ cells.

We report on the growth and properties of nanocrystalline Si:H grown using a remote hot wire deposition system. Unlike previous results, the temperature of the substrate is not significantly affected by the hot filament in our system. The crystallinity of the growing film and the type of grain structure was systematically varied by changing the filament temperature and the degree of hydrogen dilution. It was found that high hydrogen dilution gave rise to random nucleation and <111> grain growth, whereas lower hydrogen dilution led to preferable growth of <220> grains. Similarly, a high filament temperature gave rise to preferential <111> growth compared to lower filament temperature. The electronic properties such as defect density and minority carrier diffusion length were studied as a function of the degree of crystallinity. It was found that the lowest defect density was obtained for a material which had an intermediate range of crystallnity, as determined from the Raman spectrum. Both highly amorphous and highly crystalline materials gave higher defect densities. The diffusion lengths were measured using a quantum efficiency technique, and were found to be the highest for the mid-range crystalline material. The results suggest that having an amorphous tissue surrounding the crystalline grain helps in passivating the grain boundaries.

Efficient thin-film polycrystalline-silicon (pc-Si) solar cells on inexpensive substrates could lower the price of photovoltaic electricity substantially. At the MRS conference in 2006, we presented a pc-Si solar cell with an efficiency of 5.9% that had an absorber layer made by aluminum-induced crystallization (AIC) of amorphous silicon followed by high-temperature epitaxial thickening. The efficiency of this cell was mainly limited by the current density. To obtain higher efficiencies, we therefore need to implement an effective light trapping scheme in our pc-Si solar cell process. In this work, we describe how we recently enhanced the current density and efficiency of our cells. We achieved a cell efficiency of 8.0% for pc-Si cells in substrate configuration. Our cell process is based on pc-Si layers made by AIC and thermal CVD on smoothened alumina substrates. The cells are in substrate configuration with deposited a-Si heterojunction emitters and interdigitated top contacts. The front surface of the cells is plasma textured which leads to an increase in current density. The current density is further enhanced by minimizing the back surface field thickness of the cells to reduce the light loss in this layer. Our present pc-Si solar cell efficiency together with the fast progression that we have made over the last few years indicate the large potential of pc-Si solar cells based on the AIC seed layer approach.